Zinc Oxide ZnO (sputtering target)

Introducing our Zinc Oxide (ZnO) Sputtering Target - the epitome of excellence in the field of deposition materials.

Crafted with utmost precision and utilizing the highest quality materials, our Zinc Oxide Sputtering Target is designed to meet the demands of various sputtering applications.

With its exceptional purity and uniformity, this sputtering target guarantees superior performance and consistent results in thin film deposition processes. Whether you require thin films for optical coatings, semiconductor devices, or solar cells, our Zinc Oxide Sputtering Target is the perfect choice for your needs.

Not limited to sputtering applications, our Zinc Oxide Sputtering Target can also be utilized as an evaporation source, further expanding its versatility in the realm of deposition materials.

Backed by cutting-edge technology and extensive research, our Zinc Oxide Sputtering Target ensures optimal film quality, high deposition rates, and enhanced productivity.

Invest in our Zinc Oxide Sputtering Target and experience the pinnacle of excellence in deposition materials. Trust in our commitment to delivering only the best for your sputtering targets, evaporation sources, and other deposition material requirements.

Zinc Oxide (ZnO) Specifications：