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Tantalum (Ta) Sputtering Targets

sputtering targets, evaporation sources and other deposition materials
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Introducing our premium Tantalum (Ta) Sputtering Targets, designed to meet the diverse needs of various industries. Our sputtering targets, alongside evaporation sources and other deposition materials, are meticulously crafted to ensure exceptional performance and reliability in thin film deposition processes.


Crafted with utmost precision, our Tantalum (Ta) Sputtering Targets offer outstanding uniformity, purity, and density, guaranteeing consistent and high-quality thin film coatings. These targets are engineered to withstand rigorous sputtering conditions, enabling efficient and controlled deposition of Tantalum films on substrates.


With our Tantalum (Ta) Sputtering Targets, you can achieve precise and reproducible thin film coatings for applications such as semiconductor devices, optical coatings, magnetic storage media, and more. Our targets are available in various shapes, sizes, and configurations to cater to your specific requirements, ensuring compatibility with different sputtering systems.


We take pride in our commitment to delivering top-notch products that meet the highest industry standards. Our Tantalum (Ta) Sputtering Targets undergo rigorous quality control measures to ensure exceptional performance, longevity, and customer satisfaction.


Partner with us and experience the excellence of our Tantalum (Ta) Sputtering Targets, evaporation sources, and other deposition materials. Elevate your thin film deposition processes with our professional-grade products, designed to meet the demands of even the most challenging applications. Trust in our expertise and unlock new possibilities in your deposition processes.

Tantalum (Ta) Specifications:

Material Type

Tantalum

Symbol

Ta

Atomic Weight

180.9479

Atomic Number

73

Color/Appearance

Gray Blue, Metallic

Thermal Conductivity

57 W/m.K

Melting Point (°C)

3,017

Coefficient of Thermal   Expansion

6.3 x 10-6/K

Theoretical Density (g/cc)

16.6

Z Ratio

0.262

Sputter

DC

Max Power Density

(Watts/Square Inch)

100*

Type of Bond

Indium, Elastomer

Comments

Forms good films.


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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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