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Introducing our high-quality Silicon Nitride (Si3N4) Sputtering Targets, designed to meet your precise deposition needs. These targets are meticulously crafted to deliver exceptional performance and ensure optimal results in various sputtering applications.
Our Silicon Nitride Sputtering Targets are specifically engineered to provide a reliable and efficient solution for your thin film deposition processes. With their superior purity and excellent thermal stability, these targets guarantee consistent and uniform film growth, enabling you to achieve the desired thin film properties with utmost precision.
In addition to sputtering targets, we also offer a comprehensive range of evaporation sources and other deposition materials. Our extensive selection ensures that you have access to the highest quality materials required for your deposition techniques, allowing you to tailor your processes to meet the specific demands of your applications.
With our commitment to delivering only the finest products, our Silicon Nitride Sputtering Targets, evaporation sources, and other deposition materials undergo rigorous quality control measures to ensure exceptional performance and reliability. Furthermore, our team of experts is readily available to provide technical support and guidance, ensuring a seamless integration of our products into your deposition processes.
Choose our Silicon Nitride Sputtering Targets, evaporation sources, and other deposition materials for unparalleled performance, consistency, and reliability. Experience the difference in your thin film deposition techniques with our top-of-the-line products.
Silicon Nitride (Si3N4) Specifications：
Material Type | Silicon Nitride |
Symbol | Si3N4 |
Color/Appearance | White to Gray or Dark Gray to Black, Crystalline Solid |
Melting Point (°C) | 1,900 |
Theoretical Density (g/cc) | 3.44 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Material Type | Silicon Nitride |
Introducing our high-quality Silicon Nitride (Si3N4) Sputtering Targets, designed to meet your precise deposition needs. These targets are meticulously crafted to deliver exceptional performance and ensure optimal results in various sputtering applications.
Our Silicon Nitride Sputtering Targets are specifically engineered to provide a reliable and efficient solution for your thin film deposition processes. With their superior purity and excellent thermal stability, these targets guarantee consistent and uniform film growth, enabling you to achieve the desired thin film properties with utmost precision.
In addition to sputtering targets, we also offer a comprehensive range of evaporation sources and other deposition materials. Our extensive selection ensures that you have access to the highest quality materials required for your deposition techniques, allowing you to tailor your processes to meet the specific demands of your applications.
With our commitment to delivering only the finest products, our Silicon Nitride Sputtering Targets, evaporation sources, and other deposition materials undergo rigorous quality control measures to ensure exceptional performance and reliability. Furthermore, our team of experts is readily available to provide technical support and guidance, ensuring a seamless integration of our products into your deposition processes.
Choose our Silicon Nitride Sputtering Targets, evaporation sources, and other deposition materials for unparalleled performance, consistency, and reliability. Experience the difference in your thin film deposition techniques with our top-of-the-line products.
Silicon Nitride (Si3N4) Specifications：
Material Type | Silicon Nitride |
Symbol | Si3N4 |
Color/Appearance | White to Gray or Dark Gray to Black, Crystalline Solid |
Melting Point (°C) | 1,900 |
Theoretical Density (g/cc) | 3.44 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Material Type | Silicon Nitride |
