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Introducing our Silicon (Si (N-type)) Sputtering Targets, the ultimate solution for your sputtering and deposition needs.
Our sputtering targets are specifically designed to provide exceptional performance and reliability in various thin film deposition applications. Made from high-quality Silicon (Si (N-type)), these targets offer excellent uniformity, purity, and density, ensuring precise and consistent film deposition.
Whether you are working in the semiconductor industry, optical coatings, or research and development, our Silicon (Si (N-type)) Sputtering Targets are the ideal choice. With their superior composition and exceptional purity, these targets guarantee high film quality and enable the deposition of thin films with excellent electrical and optical properties.
In addition to sputtering targets, we also offer a wide range of evaporation sources and other deposition materials to meet your specific requirements. Our comprehensive selection ensures that you have everything you need for successful thin film deposition processes.
Choose our Silicon (Si (N-type)) Sputtering Targets, and experience the difference in performance and quality. With our commitment to excellence and our professional tone of voice, we guarantee that our products will exceed your expectations and deliver outstanding results in your deposition applications.
Silicon (Si (N-type)) Specifications：
Material Type | Silicon (N-type) |
Symbol | Si (N-type) |
Atomic Weight | 28.0855 |
Atomic Number | 14 |
Color/Appearance | Dark Gray with a Bluish Tinge, Semi-Metallic |
Thermal Conductivity | 150 W/m.K |
Melting Point (°C) | 1,410 |
Bulk Resistivity | <0.1 OHM-CM |
Coefficient of Thermal Expansion | 2.6 x 10-6/K |
Theoretical Density (g/cc) | 2.32 |
Dopant | Phosphorous, Arsenic, or Antimony |
Z Ratio | 0.712 |
Sputter | DC, RF |
Max Power Density (Watts/Square Inch) | 40* |
Type of Bond | Indium, Elastomer |
Introducing our Silicon (Si (N-type)) Sputtering Targets, the ultimate solution for your sputtering and deposition needs.
Our sputtering targets are specifically designed to provide exceptional performance and reliability in various thin film deposition applications. Made from high-quality Silicon (Si (N-type)), these targets offer excellent uniformity, purity, and density, ensuring precise and consistent film deposition.
Whether you are working in the semiconductor industry, optical coatings, or research and development, our Silicon (Si (N-type)) Sputtering Targets are the ideal choice. With their superior composition and exceptional purity, these targets guarantee high film quality and enable the deposition of thin films with excellent electrical and optical properties.
In addition to sputtering targets, we also offer a wide range of evaporation sources and other deposition materials to meet your specific requirements. Our comprehensive selection ensures that you have everything you need for successful thin film deposition processes.
Choose our Silicon (Si (N-type)) Sputtering Targets, and experience the difference in performance and quality. With our commitment to excellence and our professional tone of voice, we guarantee that our products will exceed your expectations and deliver outstanding results in your deposition applications.
Silicon (Si (N-type)) Specifications：
Material Type | Silicon (N-type) |
Symbol | Si (N-type) |
Atomic Weight | 28.0855 |
Atomic Number | 14 |
Color/Appearance | Dark Gray with a Bluish Tinge, Semi-Metallic |
Thermal Conductivity | 150 W/m.K |
Melting Point (°C) | 1,410 |
Bulk Resistivity | <0.1 OHM-CM |
Coefficient of Thermal Expansion | 2.6 x 10-6/K |
Theoretical Density (g/cc) | 2.32 |
Dopant | Phosphorous, Arsenic, or Antimony |
Z Ratio | 0.712 |
Sputter | DC, RF |
Max Power Density (Watts/Square Inch) | 40* |
Type of Bond | Indium, Elastomer |
