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Introducing our Silicon (Si) Sputtering Targets – the epitome of excellence in sputtering targets, evaporation sources, and other deposition materials. Crafted with utmost precision and designed to meet the highest industry standards, our Silicon Sputtering Targets are the ideal choice for your thin film deposition processes.
Our Silicon Sputtering Targets are manufactured using state-of-the-art technology, ensuring exceptional purity and uniformity. With a professional tone of voice, we guarantee that our products will deliver consistent and reliable performance, making them perfect for a wide range of applications.
Featuring unparalleled durability, our Silicon Sputtering Targets are built to withstand rigorous usage, ensuring long-lasting performance and minimizing downtime. Their exceptional thermal conductivity and high melting point make them highly efficient and ideal for various deposition techniques, including magnetron sputtering and thermal evaporation.
Our commitment to quality is reflected in every aspect of our Silicon Sputtering Targets. We meticulously control the manufacturing process to guarantee exceptional purity, ensuring minimal impurities and defects. The precise dimensions and surface finish of our targets enable optimal film deposition, resulting in superior thin film quality.
Whether you are in the semiconductor, optical coating, or solar cell industry, our Silicon Sputtering Targets are the perfect choice for your thin film deposition needs. Trust in our professional-grade products to enhance your manufacturing processes and achieve outstanding results.
Invest in our Silicon Sputtering Targets today and experience the pinnacle of excellence in sputtering targets, evaporation sources, and other deposition materials. Contact us now to discuss your requirements and discover how our products can revolutionize your thin film deposition processes.
Silicon (Si) Specifications：
Material Type | Silicon |
Symbol | Si |
Atomic Weight | 28.0855 |
Atomic Number | 14 |
Color/Appearance | Dark Gray with a Bluish Tinge, Semi-Metallic |
Thermal Conductivity | 150 W/m.K |
Melting Point (°C) | 1,410 |
Bulk Resistivity | >1 OHM-CM |
Coefficient of Thermal Expansion | 2.6 x 10-6/K |
Theoretical Density (g/cc) | 2.32 |
Dopant | Undoped |
Z Ratio | 0.712 |
Sputter | RF |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Alloys with W; use heavy W boat. SiO produced. |
Introducing our Silicon (Si) Sputtering Targets – the epitome of excellence in sputtering targets, evaporation sources, and other deposition materials. Crafted with utmost precision and designed to meet the highest industry standards, our Silicon Sputtering Targets are the ideal choice for your thin film deposition processes.
Our Silicon Sputtering Targets are manufactured using state-of-the-art technology, ensuring exceptional purity and uniformity. With a professional tone of voice, we guarantee that our products will deliver consistent and reliable performance, making them perfect for a wide range of applications.
Featuring unparalleled durability, our Silicon Sputtering Targets are built to withstand rigorous usage, ensuring long-lasting performance and minimizing downtime. Their exceptional thermal conductivity and high melting point make them highly efficient and ideal for various deposition techniques, including magnetron sputtering and thermal evaporation.
Our commitment to quality is reflected in every aspect of our Silicon Sputtering Targets. We meticulously control the manufacturing process to guarantee exceptional purity, ensuring minimal impurities and defects. The precise dimensions and surface finish of our targets enable optimal film deposition, resulting in superior thin film quality.
Whether you are in the semiconductor, optical coating, or solar cell industry, our Silicon Sputtering Targets are the perfect choice for your thin film deposition needs. Trust in our professional-grade products to enhance your manufacturing processes and achieve outstanding results.
Invest in our Silicon Sputtering Targets today and experience the pinnacle of excellence in sputtering targets, evaporation sources, and other deposition materials. Contact us now to discuss your requirements and discover how our products can revolutionize your thin film deposition processes.
Silicon (Si) Specifications：
Material Type | Silicon |
Symbol | Si |
Atomic Weight | 28.0855 |
Atomic Number | 14 |
Color/Appearance | Dark Gray with a Bluish Tinge, Semi-Metallic |
Thermal Conductivity | 150 W/m.K |
Melting Point (°C) | 1,410 |
Bulk Resistivity | >1 OHM-CM |
Coefficient of Thermal Expansion | 2.6 x 10-6/K |
Theoretical Density (g/cc) | 2.32 |
Dopant | Undoped |
Z Ratio | 0.712 |
Sputter | RF |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Alloys with W; use heavy W boat. SiO produced. |
