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Introducing our top-of-the-line Silicon (Si (P-type)) Sputtering Targets, the ultimate solution for your sputtering and deposition needs.
Crafted with precision and expertise, our sputtering targets are designed to deliver exceptional performance in various thin film deposition applications. Whether you require sputtering targets, evaporation sources, or other deposition materials, we have got you covered.
Our Silicon (Si (P-type)) Sputtering Targets are manufactured using the highest quality materials, ensuring durability and reliability. With their exceptional purity and uniformity, these targets guarantee consistent and precise deposition results.
Engineered for professionals, our sputtering targets offer excellent thermal conductivity and electrical resistivity, making them ideal for a wide range of applications, including semiconductor manufacturing, optical coatings, and research and development.
With our Silicon (Si (P-type)) Sputtering Targets, you can achieve superior film quality, high deposition rates, and excellent adhesion, resulting in enhanced performance and productivity.
Trust in our expertise and experience to provide you with the finest sputtering targets, evaporation sources, and other deposition materials. Choose our Silicon (Si (P-type)) Sputtering Targets for unmatched quality and reliability in your thin film deposition processes.
Silicon (Si (P-type)) Specifications：
Material Type | Silicon (P-type) |
Symbol | Si (P-type) |
Atomic Weight | 28.0855 |
Atomic Number | 14 |
Color/Appearance | Dark Gray with a Bluish Tinge, Semi-Metallic |
Thermal Conductivity | 150 W/m.K |
Melting Point (°C) | 1,410 |
Bulk Resistivity | 0.005-0.020 OHM-CM |
Coefficient of Thermal Expansion | 2.6 x 10-6/K |
Theoretical Density (g/cc) | 2.32 |
Dopant | Boron |
Z Ratio | 0.712 |
Sputter | DC, RF |
Max Power Density (Watts/Square Inch) | 40* |
Type of Bond | Indium, Elastomer |
Introducing our top-of-the-line Silicon (Si (P-type)) Sputtering Targets, the ultimate solution for your sputtering and deposition needs.
Crafted with precision and expertise, our sputtering targets are designed to deliver exceptional performance in various thin film deposition applications. Whether you require sputtering targets, evaporation sources, or other deposition materials, we have got you covered.
Our Silicon (Si (P-type)) Sputtering Targets are manufactured using the highest quality materials, ensuring durability and reliability. With their exceptional purity and uniformity, these targets guarantee consistent and precise deposition results.
Engineered for professionals, our sputtering targets offer excellent thermal conductivity and electrical resistivity, making them ideal for a wide range of applications, including semiconductor manufacturing, optical coatings, and research and development.
With our Silicon (Si (P-type)) Sputtering Targets, you can achieve superior film quality, high deposition rates, and excellent adhesion, resulting in enhanced performance and productivity.
Trust in our expertise and experience to provide you with the finest sputtering targets, evaporation sources, and other deposition materials. Choose our Silicon (Si (P-type)) Sputtering Targets for unmatched quality and reliability in your thin film deposition processes.
Silicon (Si (P-type)) Specifications：
Material Type | Silicon (P-type) |
Symbol | Si (P-type) |
Atomic Weight | 28.0855 |
Atomic Number | 14 |
Color/Appearance | Dark Gray with a Bluish Tinge, Semi-Metallic |
Thermal Conductivity | 150 W/m.K |
Melting Point (°C) | 1,410 |
Bulk Resistivity | 0.005-0.020 OHM-CM |
Coefficient of Thermal Expansion | 2.6 x 10-6/K |
Theoretical Density (g/cc) | 2.32 |
Dopant | Boron |
Z Ratio | 0.712 |
Sputter | DC, RF |
Max Power Density (Watts/Square Inch) | 40* |
Type of Bond | Indium, Elastomer |
