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Introducing our high-quality Palladium (Pd) Sputtering Targets, designed to meet your advanced deposition needs. With a professional tone of voice, we proudly present our exceptional range of sputtering targets, evaporation sources, and other deposition materials.
Our Palladium (Pd) Sputtering Targets are meticulously engineered to provide superior performance and reliability in various thin film deposition applications. These targets are manufactured using state-of-the-art technology and adhere to strict quality control measures, ensuring consistent and precise results every time.
Designed for use in physical vapor deposition (PVD) processes, our Palladium (Pd) Sputtering Targets offer exceptional purity and uniformity, guaranteeing efficient and uniform film deposition. These targets are available in various shapes and sizes, allowing for compatibility with different sputtering systems and customized requirements.
Our commitment to excellence extends beyond product quality. We understand the importance of prompt and reliable customer support. Our team of experts is always ready to assist you with technical queries, product selection, and any other assistance you may require.
Whether you are in the semiconductor, optical coating, or research and development industry, our Palladium (Pd) Sputtering Targets are the ideal choice for your thin film deposition needs. Trust in our professional-grade products to achieve precise and consistent results, enabling you to stay ahead in your field.
Choose our Palladium (Pd) Sputtering Targets for unrivaled performance, exceptional quality, and outstanding customer service. Experience the difference today and elevate your deposition processes to new heights.
Palladium (Pd) Specifications：
Material Type | Palladium |
Symbol | Pd |
Atomic Weight | 106.42 |
Atomic Number | 46 |
Color/Appearance | Silvery White Metallic |
Thermal Conductivity | 72 W/m.K |
Melting Point (°C) | 1,554 |
Coefficient of Thermal Expansion | 11.8 x 10-6/K |
Theoretical Density (g/cc) | 12.02 |
Z Ratio | 0.357 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 100* |
Type of Bond | Indium, Elastomer |
Comments | Alloys with refractory metals. |
Introducing our high-quality Palladium (Pd) Sputtering Targets, designed to meet your advanced deposition needs. With a professional tone of voice, we proudly present our exceptional range of sputtering targets, evaporation sources, and other deposition materials.
Our Palladium (Pd) Sputtering Targets are meticulously engineered to provide superior performance and reliability in various thin film deposition applications. These targets are manufactured using state-of-the-art technology and adhere to strict quality control measures, ensuring consistent and precise results every time.
Designed for use in physical vapor deposition (PVD) processes, our Palladium (Pd) Sputtering Targets offer exceptional purity and uniformity, guaranteeing efficient and uniform film deposition. These targets are available in various shapes and sizes, allowing for compatibility with different sputtering systems and customized requirements.
Our commitment to excellence extends beyond product quality. We understand the importance of prompt and reliable customer support. Our team of experts is always ready to assist you with technical queries, product selection, and any other assistance you may require.
Whether you are in the semiconductor, optical coating, or research and development industry, our Palladium (Pd) Sputtering Targets are the ideal choice for your thin film deposition needs. Trust in our professional-grade products to achieve precise and consistent results, enabling you to stay ahead in your field.
Choose our Palladium (Pd) Sputtering Targets for unrivaled performance, exceptional quality, and outstanding customer service. Experience the difference today and elevate your deposition processes to new heights.
Palladium (Pd) Specifications：
Material Type | Palladium |
Symbol | Pd |
Atomic Weight | 106.42 |
Atomic Number | 46 |
Color/Appearance | Silvery White Metallic |
Thermal Conductivity | 72 W/m.K |
Melting Point (°C) | 1,554 |
Coefficient of Thermal Expansion | 11.8 x 10-6/K |
Theoretical Density (g/cc) | 12.02 |
Z Ratio | 0.357 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 100* |
Type of Bond | Indium, Elastomer |
Comments | Alloys with refractory metals. |
