| Quantity: | |
|---|---|
TN
Introducing our Platinum (Pt) Sputtering Targets, the epitome of excellence in the world of thin film deposition. Crafted with utmost precision and cutting-edge technology, these sputtering targets are designed to meet the demands of even the most intricate applications.
Our Platinum (Pt) Sputtering Targets are not just mere materials; they are the building blocks of innovation. With exceptional purity and uniformity, these targets enable precise control over film thickness, composition, and morphology. Whether you are working on semiconductor devices, optical coatings, or magnetic storage media, our sputtering targets guarantee exceptional performance and reproducibility.
But our commitment to excellence doesn't stop at Platinum (Pt) Sputtering Targets. We offer a comprehensive range of evaporation sources and other deposition materials to cater to your diverse needs. From high-purity metals to alloys and compounds, our product portfolio is designed to provide you with the utmost flexibility and reliability in your thin film deposition processes.
When it comes to thin film deposition, precision is paramount. That's why our Platinum (Pt) Sputtering Targets, evaporation sources, and other deposition materials undergo rigorous quality control measures to ensure consistent performance and exceptional results. Backed by our state-of-the-art manufacturing facilities and a team of experts, we guarantee products that meet the highest industry standards.
Choose our Platinum (Pt) Sputtering Targets and experience the pinnacle of quality and performance in thin film deposition. Trust in our expertise and let us be your partner in pushing the boundaries of innovation.
Platinum (Pt) Specifications：
Material Type | Platinum |
Symbol | Pt |
Atomic Weight | 195.084 |
Atomic Number | 78 |
Color/Appearance | Metallic Gray |
Thermal Conductivity | 72 W/m.K |
Melting Point (°C) | 1,772 |
Coefficient of Thermal Expansion | 8.8 x 10-6/K |
Introducing our Platinum (Pt) Sputtering Targets, the epitome of excellence in the world of thin film deposition. Crafted with utmost precision and cutting-edge technology, these sputtering targets are designed to meet the demands of even the most intricate applications.
Our Platinum (Pt) Sputtering Targets are not just mere materials; they are the building blocks of innovation. With exceptional purity and uniformity, these targets enable precise control over film thickness, composition, and morphology. Whether you are working on semiconductor devices, optical coatings, or magnetic storage media, our sputtering targets guarantee exceptional performance and reproducibility.
But our commitment to excellence doesn't stop at Platinum (Pt) Sputtering Targets. We offer a comprehensive range of evaporation sources and other deposition materials to cater to your diverse needs. From high-purity metals to alloys and compounds, our product portfolio is designed to provide you with the utmost flexibility and reliability in your thin film deposition processes.
When it comes to thin film deposition, precision is paramount. That's why our Platinum (Pt) Sputtering Targets, evaporation sources, and other deposition materials undergo rigorous quality control measures to ensure consistent performance and exceptional results. Backed by our state-of-the-art manufacturing facilities and a team of experts, we guarantee products that meet the highest industry standards.
Choose our Platinum (Pt) Sputtering Targets and experience the pinnacle of quality and performance in thin film deposition. Trust in our expertise and let us be your partner in pushing the boundaries of innovation.
Platinum (Pt) Specifications：
Material Type | Platinum |
Symbol | Pt |
Atomic Weight | 195.084 |
Atomic Number | 78 |
Color/Appearance | Metallic Gray |
Thermal Conductivity | 72 W/m.K |
Melting Point (°C) | 1,772 |
Coefficient of Thermal Expansion | 8.8 x 10-6/K |
