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Introducing our high-quality Niobium Oxide (Nb2O5) Sputtering Targets. These targets are specifically designed for sputtering applications, as well as for use as evaporation sources and other deposition materials.
Crafted with utmost precision and using state-of-the-art technology, our Niobium Oxide Sputtering Targets guarantee exceptional performance and reliability. These targets are manufactured to meet the stringent requirements of various industries, ensuring optimal results in thin film deposition processes.
With a professional tone of voice, we proudly present our range of Niobium Oxide Sputtering Targets. These targets are meticulously engineered to deliver consistent and uniform film deposition, enabling you to achieve precise and accurate thin films with ease.
Our Niobium Oxide Sputtering Targets are highly durable and possess excellent thermal stability, making them ideal for prolonged usage in demanding sputtering environments. The superior purity of our targets ensures minimal impurities, resulting in high film quality and enhanced productivity.
Whether you require sputtering targets, evaporation sources, or other deposition materials, our Niobium Oxide Sputtering Targets are the perfect choice. Trust in our expertise and experience to meet your specific thin film deposition needs, ensuring superior performance and exceptional results.
Invest in our Niobium Oxide Sputtering Targets today and experience the difference in your thin film deposition processes. With our commitment to delivering top-notch quality and exceptional customer satisfaction, we guarantee that our products will exceed your expectations.
Niobium Oxide (Nb2O5) Specifications:
Material Type | Niobium (V) Oxide |
Symbol | Nb2O5 |
Color/Appearance | White, Crystalline Solid |
Melting Point (°C) | 1,485 |
Theoretical Density (g/cc) | 4.6 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Type of Bond | Indium, Elastomer |
Introducing our high-quality Niobium Oxide (Nb2O5) Sputtering Targets. These targets are specifically designed for sputtering applications, as well as for use as evaporation sources and other deposition materials.
Crafted with utmost precision and using state-of-the-art technology, our Niobium Oxide Sputtering Targets guarantee exceptional performance and reliability. These targets are manufactured to meet the stringent requirements of various industries, ensuring optimal results in thin film deposition processes.
With a professional tone of voice, we proudly present our range of Niobium Oxide Sputtering Targets. These targets are meticulously engineered to deliver consistent and uniform film deposition, enabling you to achieve precise and accurate thin films with ease.
Our Niobium Oxide Sputtering Targets are highly durable and possess excellent thermal stability, making them ideal for prolonged usage in demanding sputtering environments. The superior purity of our targets ensures minimal impurities, resulting in high film quality and enhanced productivity.
Whether you require sputtering targets, evaporation sources, or other deposition materials, our Niobium Oxide Sputtering Targets are the perfect choice. Trust in our expertise and experience to meet your specific thin film deposition needs, ensuring superior performance and exceptional results.
Invest in our Niobium Oxide Sputtering Targets today and experience the difference in your thin film deposition processes. With our commitment to delivering top-notch quality and exceptional customer satisfaction, we guarantee that our products will exceed your expectations.
Niobium Oxide (Nb2O5) Specifications:
Material Type | Niobium (V) Oxide |
Symbol | Nb2O5 |
Color/Appearance | White, Crystalline Solid |
Melting Point (°C) | 1,485 |
Theoretical Density (g/cc) | 4.6 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Type of Bond | Indium, Elastomer |
