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TN-VPC-300
TN
Perelin true Air Phase deposition (PECVD) is a commonly used thin film deposition technique for preparing thin films on the surface of a material. It is the process of depositing a thin film in a vacuum environment using a vapor phase chemical reaction. In Perelin true air phase deposition, a vacuum environment needs to be established first to ensure that there is no gas interference during deposition. Then, by introducing the gas into the reaction chamber, it reacts with the surface and is deposited to form a film.
Perelin true air phase deposition can be used to prepare various different types of films such as silicon nitride, silicon oxide, aluminum nitride, etc. It has a wide range of applications in semiconductor, optoelectronics, display devices and other fields, and can be used to prepare thin film resistors, optical coatings, heat insulation, etc.
Pirelin true air phase deposition has some advantages, such as fast deposition speed, good deposition uniformity and strong controllability. However, it also has some limitations, such as the inability to deposit a large area of thin film and the need for a high vacuum environment.
Overall, Perelin true air phase deposition is an important film preparation technique that can provide high quality film materials in a variety of applications.
Parameters of Perelin true air deposition equipment
Device name | Perelin true air phase deposition equipment | |||
Product Model | TN-VPC-300 | |||
Work environment | Power supply: 380V five-wire 4 square cable, maximum power l0KW | |||
Ambient temperature: 0-40℃ | ||||
Ambient humidity: < 90% | ||||
Size | The appearance size is 1580*880*1550mm, covers an area of about 1.5 square meters, and there should be more than 50cm operating space around the installation | |||
Heating part | Sublimation area | Raw material bin: φ69*200mm Capacity :300g | ||
Evaporation temperature: room temperature 200℃ | ||||
Temperature deviation :±2℃ | ||||
Cracking Zone | Cracking temperature :650-700℃ Temperature stability: ± 2℃ | |||
Insulation area | Heating temperature < 300 。 C | |||
Control system | Branding | PLC control system | ||
Program | There are two parts for automatic deposition system and manual deposition system | |||
Display | Display size :12 "touch color screen | |||
Depositional system | Vacuum substrate | 1, size φ300xH400, 304 stainless steel | ||
Chamber | 28L | |||
volume | ||||
Observation window | 1 viewing window for easy observation of the condition of the product in the deposition chamber | |||
Rotating section | Motor speed adjustable 1-10 RPM | |||
Vacuum system | Vacuum pump | |||
Vacuum gauge | ||||
Refrigeration system | Cold TH-95-15 -G(pot type), refrigeration temperature ≤90 。 C within 30 minutes after starting refrigeration can be from room temperature to -70 。 C | |||
Coupling agent evaporation device | Improve the adhesion of the perelin coating to the surface of the substrate to be coated | |||
Main parts of equipment | 1, evaporation system: evaporation chamber, electric power n heat device, temperature sensor 2, cracking system: cracking chamber, electric thermal device, temperature sensor 3, deposition system: deposition chamber, vacuum sensor, sample rack 4, vacuum system: vacuum pump, vacuum gauge 5, condensing system: pot type cold trap 6, equipment host: equipment shell, control circuit, vacuum pipe 7, quartz tube: 1 | |||
Sedimentable raw material type | Parylene C, N, F, D | |||
Equipment Features | 1, the gasification heating can be moved, suitable for continuous production, such as sudden power failure and other unexpected circumstances can be removed at anytime to ensure product safety. 2, the gasification part is a transparent glass tube, which can be viewed at any time, and can maintain low temperature production to meet the high requirements of coating. 3, gasification can be moved, is to send the patent setting, can ensure no patent conflict, production safety. 4. The special design of the internal rotating frame of the cavity can effectively reduce the number of bad points. 5. Visual and humanized interface, easy to understand operation. 6, glass tube,can greatly reduce the heating and cooling time. 7. The insulation part is optimized, so that Perelin is not easy to deposit in the inner wall of the glass tube, which can be maintained for a long time and reduce the maintenance time | |||
Perelin true Air Phase deposition (PECVD) is a commonly used thin film deposition technique for preparing thin films on the surface of a material. It is the process of depositing a thin film in a vacuum environment using a vapor phase chemical reaction. In Perelin true air phase deposition, a vacuum environment needs to be established first to ensure that there is no gas interference during deposition. Then, by introducing the gas into the reaction chamber, it reacts with the surface and is deposited to form a film.
Perelin true air phase deposition can be used to prepare various different types of films such as silicon nitride, silicon oxide, aluminum nitride, etc. It has a wide range of applications in semiconductor, optoelectronics, display devices and other fields, and can be used to prepare thin film resistors, optical coatings, heat insulation, etc.
Pirelin true air phase deposition has some advantages, such as fast deposition speed, good deposition uniformity and strong controllability. However, it also has some limitations, such as the inability to deposit a large area of thin film and the need for a high vacuum environment.
Overall, Perelin true air phase deposition is an important film preparation technique that can provide high quality film materials in a variety of applications.
Parameters of Perelin true air deposition equipment
Device name | Perelin true air phase deposition equipment | |||
Product Model | TN-VPC-300 | |||
Work environment | Power supply: 380V five-wire 4 square cable, maximum power l0KW | |||
Ambient temperature: 0-40℃ | ||||
Ambient humidity: < 90% | ||||
Size | The appearance size is 1580*880*1550mm, covers an area of about 1.5 square meters, and there should be more than 50cm operating space around the installation | |||
Heating part | Sublimation area | Raw material bin: φ69*200mm Capacity :300g | ||
Evaporation temperature: room temperature 200℃ | ||||
Temperature deviation :±2℃ | ||||
Cracking Zone | Cracking temperature :650-700℃ Temperature stability: ± 2℃ | |||
Insulation area | Heating temperature < 300 。 C | |||
Control system | Branding | PLC control system | ||
Program | There are two parts for automatic deposition system and manual deposition system | |||
Display | Display size :12 "touch color screen | |||
Depositional system | Vacuum substrate | 1, size φ300xH400, 304 stainless steel | ||
Chamber | 28L | |||
volume | ||||
Observation window | 1 viewing window for easy observation of the condition of the product in the deposition chamber | |||
Rotating section | Motor speed adjustable 1-10 RPM | |||
Vacuum system | Vacuum pump | |||
Vacuum gauge | ||||
Refrigeration system | Cold TH-95-15 -G(pot type), refrigeration temperature ≤90 。 C within 30 minutes after starting refrigeration can be from room temperature to -70 。 C | |||
Coupling agent evaporation device | Improve the adhesion of the perelin coating to the surface of the substrate to be coated | |||
Main parts of equipment | 1, evaporation system: evaporation chamber, electric power n heat device, temperature sensor 2, cracking system: cracking chamber, electric thermal device, temperature sensor 3, deposition system: deposition chamber, vacuum sensor, sample rack 4, vacuum system: vacuum pump, vacuum gauge 5, condensing system: pot type cold trap 6, equipment host: equipment shell, control circuit, vacuum pipe 7, quartz tube: 1 | |||
Sedimentable raw material type | Parylene C, N, F, D | |||
Equipment Features | 1, the gasification heating can be moved, suitable for continuous production, such as sudden power failure and other unexpected circumstances can be removed at anytime to ensure product safety. 2, the gasification part is a transparent glass tube, which can be viewed at any time, and can maintain low temperature production to meet the high requirements of coating. 3, gasification can be moved, is to send the patent setting, can ensure no patent conflict, production safety. 4. The special design of the internal rotating frame of the cavity can effectively reduce the number of bad points. 5. Visual and humanized interface, easy to understand operation. 6, glass tube,can greatly reduce the heating and cooling time. 7. The insulation part is optimized, so that Perelin is not easy to deposit in the inner wall of the glass tube, which can be maintained for a long time and reduce the maintenance time | |||
