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Introducing our Multi Evaporation Sources High Vacuum Evaporation Coater for Deposition Ti And Au for Contacts. This state-of-the-art equipment is designed to provide exceptional performance and precision in the deposition process.
Our High Vacuum Evaporation Coater is built with the latest technology, primarily focusing on metal/organic source evaporation. This makes it an ideal choice for various applications, including the preparation of metal elements, oxides, dielectrics, and semiconductor films.
With its advanced features and capabilities, this coater ensures a high vacuum environment, allowing for precise and controlled deposition of titanium (Ti) and gold (Au) for contacts. The result is a uniform and reliable coating, essential for achieving optimal performance in electronic devices and other related industries.
This professional-grade equipment is engineered to meet the demands of research laboratories, universities, and industrial facilities. Its robust construction guarantees durability and longevity, ensuring years of dependable service.
Furthermore, our Multi Evaporation Sources High Vacuum Evaporation Coater boasts user-friendly controls and an intuitive interface, enabling operators to easily set parameters and monitor the deposition process. This enhances productivity and efficiency, saving valuable time and resources.
In addition to its exceptional performance, this coater adheres to the highest safety standards, providing a secure environment for operators throughout the entire deposition process.
Invest in our Multi Evaporation Sources High Vacuum Evaporation Coater for Deposition Ti And Au for Contacts, and experience the pinnacle of precision and reliability in thin film deposition. Trust in our professional-grade equipment to meet your research and production needs with utmost efficiency and accuracy.
Technical parameters:
Sample stage | Size | Max support φ150mm sample | Height | Adjustable up and down 70mm |
Evaporation source | Quantity | Tungsten Boat x2 | ||
Vacuum chamber | Chamber size | Dia. 300mm X 400mm | Observation window | Front φ100mm with shading sheet |
Chamber material | 304 stainless steel | Opening method | Front door open | |
Film thickness control | Crystal vibrating film thickness measuring instrument, optional multi-channel film thickness controller | |||
Vacuum system | Backing pump | Dual stage rotary vane pump | Pumping port | KF16 |
Secondary pump | Turbo molecular pump | Pumping port | CF160 | |
Vacuum measurement | Resistance + ionization Compound vacuum gauge | Exhaust rate | Mechanical pump 1.1L / s Molecular pump 600L / s | |
Ultimate vacuum | 1.0E-5Pa | Power supply | AC 220V 50/60Hz | |
Pumping rate | Rotary vane pump: 1.1L / S | |||
Flowmeter | One way mass flowmeter 500sccm Ar gas | |||
Control System | PLC automatic control Operation interface: touch screen + operation panel | |||
Other | Supply voltage | AC380V,50Hz | Machine size | 1000mm x 800mm x 1500mm |
Total power | 5kW | Machine weight | 350kg |
Introducing our Multi Evaporation Sources High Vacuum Evaporation Coater for Deposition Ti And Au for Contacts. This state-of-the-art equipment is designed to provide exceptional performance and precision in the deposition process.
Our High Vacuum Evaporation Coater is built with the latest technology, primarily focusing on metal/organic source evaporation. This makes it an ideal choice for various applications, including the preparation of metal elements, oxides, dielectrics, and semiconductor films.
With its advanced features and capabilities, this coater ensures a high vacuum environment, allowing for precise and controlled deposition of titanium (Ti) and gold (Au) for contacts. The result is a uniform and reliable coating, essential for achieving optimal performance in electronic devices and other related industries.
This professional-grade equipment is engineered to meet the demands of research laboratories, universities, and industrial facilities. Its robust construction guarantees durability and longevity, ensuring years of dependable service.
Furthermore, our Multi Evaporation Sources High Vacuum Evaporation Coater boasts user-friendly controls and an intuitive interface, enabling operators to easily set parameters and monitor the deposition process. This enhances productivity and efficiency, saving valuable time and resources.
In addition to its exceptional performance, this coater adheres to the highest safety standards, providing a secure environment for operators throughout the entire deposition process.
Invest in our Multi Evaporation Sources High Vacuum Evaporation Coater for Deposition Ti And Au for Contacts, and experience the pinnacle of precision and reliability in thin film deposition. Trust in our professional-grade equipment to meet your research and production needs with utmost efficiency and accuracy.
Technical parameters:
Sample stage | Size | Max support φ150mm sample | Height | Adjustable up and down 70mm |
Evaporation source | Quantity | Tungsten Boat x2 | ||
Vacuum chamber | Chamber size | Dia. 300mm X 400mm | Observation window | Front φ100mm with shading sheet |
Chamber material | 304 stainless steel | Opening method | Front door open | |
Film thickness control | Crystal vibrating film thickness measuring instrument, optional multi-channel film thickness controller | |||
Vacuum system | Backing pump | Dual stage rotary vane pump | Pumping port | KF16 |
Secondary pump | Turbo molecular pump | Pumping port | CF160 | |
Vacuum measurement | Resistance + ionization Compound vacuum gauge | Exhaust rate | Mechanical pump 1.1L / s Molecular pump 600L / s | |
Ultimate vacuum | 1.0E-5Pa | Power supply | AC 220V 50/60Hz | |
Pumping rate | Rotary vane pump: 1.1L / S | |||
Flowmeter | One way mass flowmeter 500sccm Ar gas | |||
Control System | PLC automatic control Operation interface: touch screen + operation panel | |||
Other | Supply voltage | AC380V,50Hz | Machine size | 1000mm x 800mm x 1500mm |
Total power | 5kW | Machine weight | 350kg |