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Multi Evaporation Sources High Vacuum Evaporation Coater Instrument With Four Heating Sources for Semiconductor Film

Multi Evaporation Sources High Vacuum Evaporation Coater Instrument mainly used for the preparation of various conductive film, semiconductor film, ferroelectric film, optical film, micro-nano device microprocessing, electron microscope sample pretreatment, etc
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Introducing our Multi Evaporation Sources High Vacuum Evaporation Coater for Deposition Ti And Au for Contacts. This state-of-the-art equipment is designed to provide exceptional performance and precision in the deposition process.


Our High Vacuum Evaporation Coater is built with the latest technology, primarily focusing on metal/organic source evaporation. This makes it an ideal choice for various applications, including the preparation of metal elements, oxides, dielectrics, and semiconductor films.


With its advanced features and capabilities, this coater ensures a high vacuum environment, allowing for precise and controlled deposition of titanium (Ti) and gold (Au) for contacts. The result is a uniform and reliable coating, essential for achieving optimal performance in electronic devices and other related industries.


This professional-grade equipment is engineered to meet the demands of research laboratories, universities, and industrial facilities. Its robust construction guarantees durability and longevity, ensuring years of dependable service.


Furthermore, our Multi Evaporation Sources High Vacuum Evaporation Coater boasts user-friendly controls and an intuitive interface, enabling operators to easily set parameters and monitor the deposition process. This enhances productivity and efficiency, saving valuable time and resources.


In addition to its exceptional performance, this coater adheres to the highest safety standards, providing a secure environment for operators throughout the entire deposition process.


Invest in our Multi Evaporation Sources High Vacuum Evaporation Coater for Deposition Ti And Au for Contacts, and experience the pinnacle of precision and reliability in thin film deposition. Trust in our professional-grade equipment to meet your research and production needs with utmost efficiency and accuracy.


Technical parameters:


Sample   stage

Size

Max   support φ150mm sample

Height

Adjustable   up and down 70mm

Evaporation   source

Quantity

Tungsten   Boat x2



Vacuum   chamber

Chamber   size

Dia.   300mm X 400mm

Observation   window

Front   φ100mm with shading sheet

Chamber   material

304   stainless steel

Opening   method

Front   door open

Film   thickness control

Crystal   vibrating film thickness measuring instrument, optional multi-channel film   thickness controller

Vacuum   system

Backing   pump

Dual   stage rotary vane pump

Pumping   port

KF16

Secondary   pump

Turbo   molecular pump

Pumping   port

CF160

Vacuum   measurement

Resistance   + ionization

Compound   vacuum gauge

Exhaust   rate

Mechanical   pump 1.1L / s

Molecular   pump 600L / s

Ultimate   vacuum

1.0E-5Pa

Power   supply

AC 220V 50/60Hz

Pumping   rate

Rotary   vane pump: 1.1L / S

Flowmeter

One   way mass flowmeter 500sccm Ar gas

Control   System

PLC   automatic control

Operation   interface: touch screen + operation panel

Other

Supply   voltage

AC380V,50Hz

Machine   size

1000mm x 800mm x 1500mm

Total   power

5kW

Machine   weight

350kg






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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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