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Multi Evaporation Sources High Vacuum Evaporation Coater for Deposition Ti And Au for Contacts

High Vacuum Evaporation Coater is mainly based on metal/organic source evaporation. It is suitable for the preparation of metal elements, oxides, dielectrics, semiconductor films
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  • TN-EVP325S-2S

  • TN


The Multi Evaporation Sources High Vacuum Evaporation Coater Instrument with Four Heating Sources is a professional-grade equipment designed for the precise and efficient preparation of various films. This high-quality instrument is ideal for applications requiring the deposition of conductive films, semiconductor films, ferroelectric films, and optical films.


With its multi-evaporation sources, this coater instrument offers exceptional versatility and flexibility in film deposition. It allows for the simultaneous evaporation of multiple materials, enabling the creation of complex film structures with precise control over composition and thickness. This feature makes it an ideal choice for research and development, as well as production environments.


Operating under high vacuum conditions, this evaporation coater ensures a clean and contamination-free film deposition process. The vacuum environment eliminates the presence of unwanted impurities, resulting in films with excellent purity and uniformity. This is crucial for applications where film quality and performance are of utmost importance.


Equipped with four heating sources, this instrument enables efficient and uniform heating of the evaporation materials. The precise temperature control ensures optimal evaporation rates and deposition characteristics, leading to high-quality films with desired properties. The heating sources can be individually controlled, allowing for selective evaporation and deposition of different materials.


The Multi Evaporation Sources High Vacuum Evaporation Coater Instrument is designed with a professional mindset, ensuring reliable and repeatable results. Its robust construction and advanced features make it suitable for a wide range of applications, including microelectronics, optics, nanotechnology, and material science.


Invest in this state-of-the-art coater instrument to enhance your film deposition capabilities and achieve superior results in your research or production processes. With its professional-grade performance and exceptional features, it is a valuable asset for any laboratory or manufacturing facility seeking precise and efficient film preparation.


Technical parameters:


Sample   stage

Size

Max   support φ150mm sample

Height

Adjustable   up and down 70mm

Evaporation   source

Quantity

Tungsten   Boat x2



Vacuum   chamber

Chamber   size

Dia.   300mm X 400mm

Observation   window

Front   φ100mm with shading sheet

Chamber   material

304   stainless steel

Opening   method

Front   door open

Film   thickness control

Crystal   vibrating film thickness measuring instrument, optional multi-channel film   thickness controller

Vacuum   system

Backing   pump

Dual   stage rotary vane pump

Pumping   port

KF16

Secondary   pump

Turbo   molecular pump

Pumping   port

CF160

Vacuum   measurement

Resistance   + ionization

Compound   vacuum gauge

Exhaust   rate

Mechanical   pump 1.1L / s

Molecular   pump 600L / s

Ultimate   vacuum

1.0E-5Pa

Power   supply

AC 220V 50/60Hz

Pumping   rate

Rotary   vane pump: 1.1L / S

Flowmeter

One   way mass flowmeter 500sccm Ar gas

Control   System

PLC   automatic control

Operation   interface: touch screen + operation panel

Other

Supply   voltage

AC380V,50Hz

Machine   size

1000mm x 800mm x 1500mm

Total   power

5kW

Machine   weight

350kg


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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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