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TN-EVP325S-2S
TN
The Multi Evaporation Sources High Vacuum Evaporation Coater Instrument with Four Heating Sources is a professional-grade equipment designed for the precise and efficient preparation of various films. This high-quality instrument is ideal for applications requiring the deposition of conductive films, semiconductor films, ferroelectric films, and optical films.
With its multi-evaporation sources, this coater instrument offers exceptional versatility and flexibility in film deposition. It allows for the simultaneous evaporation of multiple materials, enabling the creation of complex film structures with precise control over composition and thickness. This feature makes it an ideal choice for research and development, as well as production environments.
Operating under high vacuum conditions, this evaporation coater ensures a clean and contamination-free film deposition process. The vacuum environment eliminates the presence of unwanted impurities, resulting in films with excellent purity and uniformity. This is crucial for applications where film quality and performance are of utmost importance.
Equipped with four heating sources, this instrument enables efficient and uniform heating of the evaporation materials. The precise temperature control ensures optimal evaporation rates and deposition characteristics, leading to high-quality films with desired properties. The heating sources can be individually controlled, allowing for selective evaporation and deposition of different materials.
The Multi Evaporation Sources High Vacuum Evaporation Coater Instrument is designed with a professional mindset, ensuring reliable and repeatable results. Its robust construction and advanced features make it suitable for a wide range of applications, including microelectronics, optics, nanotechnology, and material science.
Invest in this state-of-the-art coater instrument to enhance your film deposition capabilities and achieve superior results in your research or production processes. With its professional-grade performance and exceptional features, it is a valuable asset for any laboratory or manufacturing facility seeking precise and efficient film preparation.
Technical parameters:
Sample stage | Size | Max support φ150mm sample | Height | Adjustable up and down 70mm |
Evaporation source | Quantity | Tungsten Boat x2 | ||
Vacuum chamber | Chamber size | Dia. 300mm X 400mm | Observation window | Front φ100mm with shading sheet |
Chamber material | 304 stainless steel | Opening method | Front door open | |
Film thickness control | Crystal vibrating film thickness measuring instrument, optional multi-channel film thickness controller | |||
Vacuum system | Backing pump | Dual stage rotary vane pump | Pumping port | KF16 |
Secondary pump | Turbo molecular pump | Pumping port | CF160 | |
Vacuum measurement | Resistance + ionization Compound vacuum gauge | Exhaust rate | Mechanical pump 1.1L / s Molecular pump 600L / s | |
Ultimate vacuum | 1.0E-5Pa | Power supply | AC 220V 50/60Hz | |
Pumping rate | Rotary vane pump: 1.1L / S | |||
Flowmeter | One way mass flowmeter 500sccm Ar gas | |||
Control System | PLC automatic control Operation interface: touch screen + operation panel | |||
Other | Supply voltage | AC380V,50Hz | Machine size | 1000mm x 800mm x 1500mm |
Total power | 5kW | Machine weight | 350kg |
The Multi Evaporation Sources High Vacuum Evaporation Coater Instrument with Four Heating Sources is a professional-grade equipment designed for the precise and efficient preparation of various films. This high-quality instrument is ideal for applications requiring the deposition of conductive films, semiconductor films, ferroelectric films, and optical films.
With its multi-evaporation sources, this coater instrument offers exceptional versatility and flexibility in film deposition. It allows for the simultaneous evaporation of multiple materials, enabling the creation of complex film structures with precise control over composition and thickness. This feature makes it an ideal choice for research and development, as well as production environments.
Operating under high vacuum conditions, this evaporation coater ensures a clean and contamination-free film deposition process. The vacuum environment eliminates the presence of unwanted impurities, resulting in films with excellent purity and uniformity. This is crucial for applications where film quality and performance are of utmost importance.
Equipped with four heating sources, this instrument enables efficient and uniform heating of the evaporation materials. The precise temperature control ensures optimal evaporation rates and deposition characteristics, leading to high-quality films with desired properties. The heating sources can be individually controlled, allowing for selective evaporation and deposition of different materials.
The Multi Evaporation Sources High Vacuum Evaporation Coater Instrument is designed with a professional mindset, ensuring reliable and repeatable results. Its robust construction and advanced features make it suitable for a wide range of applications, including microelectronics, optics, nanotechnology, and material science.
Invest in this state-of-the-art coater instrument to enhance your film deposition capabilities and achieve superior results in your research or production processes. With its professional-grade performance and exceptional features, it is a valuable asset for any laboratory or manufacturing facility seeking precise and efficient film preparation.
Technical parameters:
Sample stage | Size | Max support φ150mm sample | Height | Adjustable up and down 70mm |
Evaporation source | Quantity | Tungsten Boat x2 | ||
Vacuum chamber | Chamber size | Dia. 300mm X 400mm | Observation window | Front φ100mm with shading sheet |
Chamber material | 304 stainless steel | Opening method | Front door open | |
Film thickness control | Crystal vibrating film thickness measuring instrument, optional multi-channel film thickness controller | |||
Vacuum system | Backing pump | Dual stage rotary vane pump | Pumping port | KF16 |
Secondary pump | Turbo molecular pump | Pumping port | CF160 | |
Vacuum measurement | Resistance + ionization Compound vacuum gauge | Exhaust rate | Mechanical pump 1.1L / s Molecular pump 600L / s | |
Ultimate vacuum | 1.0E-5Pa | Power supply | AC 220V 50/60Hz | |
Pumping rate | Rotary vane pump: 1.1L / S | |||
Flowmeter | One way mass flowmeter 500sccm Ar gas | |||
Control System | PLC automatic control Operation interface: touch screen + operation panel | |||
Other | Supply voltage | AC380V,50Hz | Machine size | 1000mm x 800mm x 1500mm |
Total power | 5kW | Machine weight | 350kg |