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TN-EVP180G-1S-G
TN
This small desktop evaporation coater is equipped with a purity quartz chamber, ensuring high-quality film deposition and excellent uniformity. This compact thermal evaporation coater is specifically designed for glove box type applications, providing a controlled and contamination-free environment. Its small size allows for easy integration into existing setups, saving valuable laboratory space. With its professional and user-friendly interface, this coater offers precise control over deposition parameters, such as temperature, deposition rate, and film thickness. The advanced heating system ensures rapid and uniform heating of the sample, resulting in efficient film deposition. Whether you are working in research and development or industrial production, this small thermal evaporation coater is the ideal choice for your film deposition needs.
Product Name | small thermal evaporation coater for glove box type |
Product Model | TN-EVP180G-1S-G（G means glove box） |
Installation Condition | 1、Working environment temperature: 25℃±15℃，humidity: 55%Rh±10%Rh； 2、Equipment power supply：AC220V，50Hz， must be well grounded； 3、Rated power：1200w； 4、Equipment for gas ：The equipment chamber should be filled with argon gas for cleaning. The customer should prepare argon gas with purity ≥99.99%. 5、Table size requirements: 580mm×250mm×330mm，bearing capacity ≥ 30kg； 6、The position should be well ventilated and cooled. |
Technical Indicators | 1、 evaporation source voltage: 10V 2、 The evaporation current is continuously adjustable from 0 to 100A 3、 With a tungsten boat, a tungsten basket; 4、 stainless steel sample table, diameter of 60mm; 5、 The distance between the sample platform and the evaporation source is adjustable from 20 to 55mm; 6、 The vacuum cavity is a quartz cavity with a diameter of 180mm and a height of 100mm;； 7、 The air pumping interface of the vacuum chamber is KF16 8、 Air intake interface is 1/4 inch double ferrule joint 9、 Touch screen is 7inch color touch screen 10、 Adjustable sputtering current ，sputtering safety current value and safety vacuum value can be set； 11、 safety protection: over current, vacuum is too low automatically cut off the sputtering current 12、 Ultimate vacuum：5E-4Pa (matching molecular pump)； 13、 Vacuum measurement is Parana vacuum gauge ，the range is1～105Pa |
Notice | 1. For the materials that are sensitive to oxygen, it is recommended to add molecular pump group. 2、In order to achieve a high oxygen free environment, the vacuum chamber should be cleaned at least 3 times with high purity inert gas. |
Optional accessory | |
Film thickness Monitor | 1、Film thickness resolution：0.0136Å（aluminum） 2、Accuracy of film thickness ：±0.5%，it depends on process conditions, especially sensor position, material stress, temperature and density 3、Measuring speed：100ms to 1s per times ，measurement range can be set ：500000Å（aluminum） 4、Standard sensor crystal：6MHz 5、Suitable for wafer frequency：6MHz suitable for wafer size：Φ14mm mounting flange：CF35 |
Another Accessory | 1、tungsten boat, tungsten basket; 2、Organic evaporation source (including quartz boat and tungsten wire heating source) 3、TN-CZK103 series high performance molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~105Pa); TN-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~102Pa) VRD-4 bipolar rotary vane vacuum pump 4、KF40 Vacuum bellows; The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket; 5、Film thickness meter crystal oscillator; |
This small desktop evaporation coater is equipped with a purity quartz chamber, ensuring high-quality film deposition and excellent uniformity. This compact thermal evaporation coater is specifically designed for glove box type applications, providing a controlled and contamination-free environment. Its small size allows for easy integration into existing setups, saving valuable laboratory space. With its professional and user-friendly interface, this coater offers precise control over deposition parameters, such as temperature, deposition rate, and film thickness. The advanced heating system ensures rapid and uniform heating of the sample, resulting in efficient film deposition. Whether you are working in research and development or industrial production, this small thermal evaporation coater is the ideal choice for your film deposition needs.
Product Name | small thermal evaporation coater for glove box type |
Product Model | TN-EVP180G-1S-G（G means glove box） |
Installation Condition | 1、Working environment temperature: 25℃±15℃，humidity: 55%Rh±10%Rh； 2、Equipment power supply：AC220V，50Hz， must be well grounded； 3、Rated power：1200w； 4、Equipment for gas ：The equipment chamber should be filled with argon gas for cleaning. The customer should prepare argon gas with purity ≥99.99%. 5、Table size requirements: 580mm×250mm×330mm，bearing capacity ≥ 30kg； 6、The position should be well ventilated and cooled. |
Technical Indicators | 1、 evaporation source voltage: 10V 2、 The evaporation current is continuously adjustable from 0 to 100A 3、 With a tungsten boat, a tungsten basket; 4、 stainless steel sample table, diameter of 60mm; 5、 The distance between the sample platform and the evaporation source is adjustable from 20 to 55mm; 6、 The vacuum cavity is a quartz cavity with a diameter of 180mm and a height of 100mm;； 7、 The air pumping interface of the vacuum chamber is KF16 8、 Air intake interface is 1/4 inch double ferrule joint 9、 Touch screen is 7inch color touch screen 10、 Adjustable sputtering current ，sputtering safety current value and safety vacuum value can be set； 11、 safety protection: over current, vacuum is too low automatically cut off the sputtering current 12、 Ultimate vacuum：5E-4Pa (matching molecular pump)； 13、 Vacuum measurement is Parana vacuum gauge ，the range is1～105Pa |
Notice | 1. For the materials that are sensitive to oxygen, it is recommended to add molecular pump group. 2、In order to achieve a high oxygen free environment, the vacuum chamber should be cleaned at least 3 times with high purity inert gas. |
Optional accessory | |
Film thickness Monitor | 1、Film thickness resolution：0.0136Å（aluminum） 2、Accuracy of film thickness ：±0.5%，it depends on process conditions, especially sensor position, material stress, temperature and density 3、Measuring speed：100ms to 1s per times ，measurement range can be set ：500000Å（aluminum） 4、Standard sensor crystal：6MHz 5、Suitable for wafer frequency：6MHz suitable for wafer size：Φ14mm mounting flange：CF35 |
Another Accessory | 1、tungsten boat, tungsten basket; 2、Organic evaporation source (including quartz boat and tungsten wire heating source) 3、TN-CZK103 series high performance molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~105Pa); TN-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~102Pa) VRD-4 bipolar rotary vane vacuum pump 4、KF40 Vacuum bellows; The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket; 5、Film thickness meter crystal oscillator; |
