| Quantity: | |
|---|---|
TN-X-EIB500
TN
The equipment is used by electron beam evaporation coating equipment, mainly used for the preparation of various conductive film, semiconductor film, ferroelectric film, optical film, micro-nano device microprocessing, electron microscope sample pretreatment, etc., especially suitable for evaporation of various refractory metal materials. It can be used not only for hard substrates such as glass wafers and silicon wafers, but also for coating on flexible substrates such as PDMS, PTFE and PI.
Technical parameters of electron beam evaporation coating:
Product name | Electron beam evaporation coating mmachine |
Product model | TN-X-EIB500 |
Service condition | Ambient temperature ranged from 5 to 40℃ |
Source | Three phase 380V |
Voltage | 220V 50HZ |
Power | <20 kW |
Water gage | <2.5bar |
Plated layer monitoring | Using SQM160 membrane thickness monitor, the inhomogeneity of coating thickness is less than 6%. |
Heat lamp | Four halogen heating lamps were used for degassing and one neon lamp for lighting |
The electrode interface | With a 2-way metal evaporation electrode interface, backup |
Water cooling system | Water pressure monitoring |
Observation window | 100mm in diameter, with X-ray filter glass |
Control system | Touch screen system |
Vacuum chamber dimensions | Evaporation chamber dimensions: Φ 500 * H500mm |
Electron gun | New electronic gun, a 6-hole crucible |
Sample turntable | Sample size: <150mm, the sample table can rotate, the sample table surface and the electron gun surface distance adjustment up and down, the adjustment distance is 200mm-250mm, the sample table can be heated, heating temperature <500℃. |
System vacuum degree | A. Limit vacuum: baking for 12~24 hours, continuous pumping, vacuum less than 5x10-5Pa B. Extraction rate: a vacuum <5x10 in 40 minutes, starting from the atmosphere-4Pa C. System leakage rate: after 12 hours of shutdown, measure the vacuum degree of the vacuum chamber is <10Pa |
The vacuum unit | FB1200 Molecular pump + VRD-16 front stage pump + side extraction valve + gate valve + cut-off valve + composite vacuum meter + coating monitoring vacuum meter interface (standby) |
The equipment is used by electron beam evaporation coating equipment, mainly used for the preparation of various conductive film, semiconductor film, ferroelectric film, optical film, micro-nano device microprocessing, electron microscope sample pretreatment, etc., especially suitable for evaporation of various refractory metal materials. It can be used not only for hard substrates such as glass wafers and silicon wafers, but also for coating on flexible substrates such as PDMS, PTFE and PI.
Technical parameters of electron beam evaporation coating:
Product name | Electron beam evaporation coating mmachine |
Product model | TN-X-EIB500 |
Service condition | Ambient temperature ranged from 5 to 40℃ |
Source | Three phase 380V |
Voltage | 220V 50HZ |
Power | <20 kW |
Water gage | <2.5bar |
Plated layer monitoring | Using SQM160 membrane thickness monitor, the inhomogeneity of coating thickness is less than 6%. |
Heat lamp | Four halogen heating lamps were used for degassing and one neon lamp for lighting |
The electrode interface | With a 2-way metal evaporation electrode interface, backup |
Water cooling system | Water pressure monitoring |
Observation window | 100mm in diameter, with X-ray filter glass |
Control system | Touch screen system |
Vacuum chamber dimensions | Evaporation chamber dimensions: Φ 500 * H500mm |
Electron gun | New electronic gun, a 6-hole crucible |
Sample turntable | Sample size: <150mm, the sample table can rotate, the sample table surface and the electron gun surface distance adjustment up and down, the adjustment distance is 200mm-250mm, the sample table can be heated, heating temperature <500℃. |
System vacuum degree | A. Limit vacuum: baking for 12~24 hours, continuous pumping, vacuum less than 5x10-5Pa B. Extraction rate: a vacuum <5x10 in 40 minutes, starting from the atmosphere-4Pa C. System leakage rate: after 12 hours of shutdown, measure the vacuum degree of the vacuum chamber is <10Pa |
The vacuum unit | FB1200 Molecular pump + VRD-16 front stage pump + side extraction valve + gate valve + cut-off valve + composite vacuum meter + coating monitoring vacuum meter interface (standby) |
