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Introducing our high-quality Magnesium Oxide (MgO) Sputtering Targets, designed to meet all your deposition needs.
Our sputtering targets are meticulously crafted to ensure exceptional performance and reliability. With our state-of-the-art manufacturing process, we guarantee consistent composition and purity levels, resulting in superior thin film deposition.
These targets are specifically engineered for sputtering applications, providing excellent material utilization and deposition rates. Whether you require thin films for semiconductor devices, optical coatings, or research purposes, our Magnesium Oxide Sputtering Targets deliver exceptional results.
In addition to sputtering targets, we also offer a wide range of evaporation sources and other deposition materials. Our comprehensive selection ensures that you have all the necessary tools to achieve precise and efficient thin film deposition.
With our commitment to quality, you can trust that our Magnesium Oxide Sputtering Targets will meet the highest industry standards. We understand the importance of reliable and consistent performance, and our products are designed to exceed your expectations.
Choose our Magnesium Oxide (MgO) Sputtering Targets for your deposition needs and experience the difference in quality and performance. Elevate your thin film deposition process with our professional-grade products.
Magnesium Oxide (MgO) Specifications:
Material Type | Magnesium Oxide |
Symbol | MgO |
Color/Appearance | White, Crystalline Solid |
Melting Point (°C) | 2,852 |
Theoretical Density (g/cc) | 3.58 |
Z Ratio | 0.411 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Evaporates in 10-3 Torr O2 for stoichiometry. |
Introducing our high-quality Magnesium Oxide (MgO) Sputtering Targets, designed to meet all your deposition needs.
Our sputtering targets are meticulously crafted to ensure exceptional performance and reliability. With our state-of-the-art manufacturing process, we guarantee consistent composition and purity levels, resulting in superior thin film deposition.
These targets are specifically engineered for sputtering applications, providing excellent material utilization and deposition rates. Whether you require thin films for semiconductor devices, optical coatings, or research purposes, our Magnesium Oxide Sputtering Targets deliver exceptional results.
In addition to sputtering targets, we also offer a wide range of evaporation sources and other deposition materials. Our comprehensive selection ensures that you have all the necessary tools to achieve precise and efficient thin film deposition.
With our commitment to quality, you can trust that our Magnesium Oxide Sputtering Targets will meet the highest industry standards. We understand the importance of reliable and consistent performance, and our products are designed to exceed your expectations.
Choose our Magnesium Oxide (MgO) Sputtering Targets for your deposition needs and experience the difference in quality and performance. Elevate your thin film deposition process with our professional-grade products.
Magnesium Oxide (MgO) Specifications:
Material Type | Magnesium Oxide |
Symbol | MgO |
Color/Appearance | White, Crystalline Solid |
Melting Point (°C) | 2,852 |
Theoretical Density (g/cc) | 3.58 |
Z Ratio | 0.411 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Comments | Evaporates in 10-3 Torr O2 for stoichiometry. |
