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Introducing our high-quality Neodymium (Nd) Sputtering Targets, designed to meet the demanding requirements of various industries. These sputtering targets are meticulously crafted to provide exceptional performance in thin film deposition processes.
Our Neodymium (Nd) Sputtering Targets are manufactured using advanced techniques, ensuring precise composition and purity. These targets are meticulously engineered to deliver consistent and reliable results, making them ideal for a wide range of applications.
With our Neodymium (Nd) Sputtering Targets, you can achieve precise thin film deposition in various industries, including semiconductor, optical, and magnetic storage. These targets are specifically designed for sputtering and evaporation processes, providing excellent adhesion and film uniformity.
In addition to Neodymium (Nd) Sputtering Targets, we also offer a comprehensive range of evaporation sources and other deposition materials. Our extensive product portfolio ensures that you have access to all the necessary materials for your thin film deposition needs.
Choose our Neodymium (Nd) Sputtering Targets for their exceptional quality, reliability, and performance. With our commitment to excellence, you can trust that our products will help you achieve the desired results in your thin film deposition processes. Experience the difference of our professional-grade sputtering targets, evaporation sources, and other deposition materials.
Neodymium (Nd) Specifications：
Material Type | Neodymium |
Symbol | Nd |
Atomic Weight | 144.242 |
Atomic Number | 60 |
Color/Appearance | Silvery White, Yellowish Tinge, Metallic |
Thermal Conductivity | 17 W/m.K |
Melting Point (°C) | 1,021 |
Coefficient of Thermal Expansion | 9.6 x 10-6/K |
Theoretical Density (g/cc) | 7.01 |
Z Ratio | **1.00 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 30* |
UN Number | 2813 |
Comments | Low W solubility. |
Introducing our high-quality Neodymium (Nd) Sputtering Targets, designed to meet the demanding requirements of various industries. These sputtering targets are meticulously crafted to provide exceptional performance in thin film deposition processes.
Our Neodymium (Nd) Sputtering Targets are manufactured using advanced techniques, ensuring precise composition and purity. These targets are meticulously engineered to deliver consistent and reliable results, making them ideal for a wide range of applications.
With our Neodymium (Nd) Sputtering Targets, you can achieve precise thin film deposition in various industries, including semiconductor, optical, and magnetic storage. These targets are specifically designed for sputtering and evaporation processes, providing excellent adhesion and film uniformity.
In addition to Neodymium (Nd) Sputtering Targets, we also offer a comprehensive range of evaporation sources and other deposition materials. Our extensive product portfolio ensures that you have access to all the necessary materials for your thin film deposition needs.
Choose our Neodymium (Nd) Sputtering Targets for their exceptional quality, reliability, and performance. With our commitment to excellence, you can trust that our products will help you achieve the desired results in your thin film deposition processes. Experience the difference of our professional-grade sputtering targets, evaporation sources, and other deposition materials.
Neodymium (Nd) Specifications：
Material Type | Neodymium |
Symbol | Nd |
Atomic Weight | 144.242 |
Atomic Number | 60 |
Color/Appearance | Silvery White, Yellowish Tinge, Metallic |
Thermal Conductivity | 17 W/m.K |
Melting Point (°C) | 1,021 |
Coefficient of Thermal Expansion | 9.6 x 10-6/K |
Theoretical Density (g/cc) | 7.01 |
Z Ratio | **1.00 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 30* |
UN Number | 2813 |
Comments | Low W solubility. |
