MSDP Unipolar Pulse Magnetron Sputtering Power Supply for plating metal films

MSDP unipolar pulse magnetron sputtering power supply

Main features:

1. Significantly improve the phenomenon of target surface charge accumulation, reduce the number of sparks on the sputtering surface, and improve the quality of the film.

2. It has an average power supply stabilization function and an ideal voltage steep drop characteristic, which fully satisfies the continuity of the magnetron sputtering process.

3. No-load voltage 1000V, working voltage 200~800V.

4. Frequency 40kHz, duty cycle 20%~80%.

5. Optional manual control / analog interface control, optional RS485 communication interface.

Using advanced PWM pulse width modulation technology, using imported IGBT or MOSFET as power switch device, it is small in size, light in weight, full in function, stable and reliable in performance, and the production process is strict and perfect.

This series of products uses advanced DSP control system to fully ensure the repeatability of the coating process, and has the function of restraining target arcing discharge and resisting short circuit.

This series of products has the excellent load matching capability, which not only ensures the stability of the target surface cleaning process, but also improves the target surface cleaning speed;

The main parameters can be continuously adjusted in a wide range;

Easy maintenance and high reliability;

PLC interface and RS485 interface expansion function, easy to achieve automatic control.

MSDP unipolar pulse magnetron sputtering power supply is a special magnetron sputtering power supply, mainly used for plating metal films, carbon films and some oxide, nitride and carbide films. It is especially suitable for coating target materials such as metals, alloys and graphite.

In magnetron sputtering, the MSDP monopolar pulse magnetron sputtering power supply can generate high-energy ions. These ions can interact with the target surface, causing the atoms on the target surface to be sputtered out and formed on the substrate surface. A thin film. This coating technology is widely used in various fields, such as surface treatment, electronic device manufacturing, optical coating, medical equipment manufacturing, etc.

In addition, the MSDP unipolar pulse magnetron sputtering power supply also has some advantages, such as high stability, high repeatability and high uniformity. These advantages make this power supply have broad application prospects in industrial production.

In general, MSDP unipolar pulse magnetron sputtering power supply is an advanced coating technology with wide application prospects and advantages.

Technical parameters: