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BD Series DC Bias Power Supply For Plasma Enhanced Chemical Vapor Deposition (PECVD)

Unbalanced magnetron sputtering coating and twin target medium frequency magnetron sputtering coating, plasma enhanced chemical vapor deposition (PECVD), and the like
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  • TN

Bias power supply is mainly used for multi-arc ion plating, magnetic filter arc ion plating, DC magnetron sputtering coating,

Unbalanced magnetron sputtering coating and twin target medium frequency magnetron sputtering coating, plasma enhanced chemical vapor deposition (PECVD), and the like.

The main functions include: glow discharge cleaning on the surface of the workpiece to be plated, ion bombardment before coating, and ion acceleration during coating.

Reasonable selection of bias power supply can effectively suppress the surface of the workpiece from igniting, and significantly improve the yield, surface finish and film-based bonding force of the plated parts.

Brand

TN

Model

BD   series DC bias power supply

Phase number

Three   phases + N

Input voltage

380V

Frequency

50HZ

Input method

4   lines (including zero line)

Output waveform

Pulse

Power

10KW—100KW   (customizable)

Voltage

0—1200V   (customizable)

Current

0-100A   (customizable)

Stability

≤1%

Ripple &   Noise

≤2%

power

≥90%

Control method

Constant   voltage, high and low voltage switching

Control   interface

Optional:   panel manual, PLC analog interface, RS485 (Modbus)

Protection

With   phase loss, overheating, voltage limiting, overvoltage, overcurrent, short   circuit, overload and other protection functions

Cooling method

Air   or water cooling

Protection level

IP21

Dimensions   (W*D*H)

Power   supply: 440 (W) ×260   (H) ×580   (D) (20KW air-cooled)

Panel:   482 (W)×280 (H)

The working voltage can be divided into A or B grades. The voltage in each grade is continuously adjustable and automatically regulated. The voltage stabilization accuracy is 1%F.S

A: 100V-1000V

B: 50V-500V


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