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MSD series low power DC magnetron sputtering power supply
Main features:
1. It uses advanced current-mode switching power supply technology to reduce output energy storage components. At the same time, it improves the suppression of sparking and restart speed, and the advantage of coating on aluminum target is more obvious.
2. It is available in constant current/constant power mode. The constant power mode guarantees the repeatability of the coating process compared to the conventional constant current mode.
3. It has an ideal voltage steep drop characteristic, automatically recognizes the phenomenon of pseudo-ignition, and fully satisfies the continuity of the magnetron sputtering process.
4. Optional manual control / analog interface control, optional RS485 communication interface.
5. This power supply is specially customized for experimental vacuum equipment. Compared with the DC magnetron sputtering power supply of production equipment, it can reduce the power supply volume and reduce the cost for customers.
Using advanced PWM pulse width modulation technology, using imported IGBT or MOSFET as power switching device, it is small in size, light in weight, full in function, stable and reliable in performance, and the production process is strict and perfect.
This series of products uses advanced DSP control system to fully ensure the repeatability of the coating process, and has the function of restraining target arcing discharge and resisting short circuit.
This series of products has excellent load matching capability, which not only ensures the stability of the target surface cleaning process, but also improves the target surface cleaning speed;
The main parameters can be continuously adjusted in a wide range;
Easy maintenance and high reliability;
PLC interface and RS485 interface expansion function, easy to achieve automatic control.
DC magnetron sputtering power supply is a common thin film preparation technology. Its application fields include but are not limited to:
Manufacturing of metal compound thin film materials: DC magnetron sputtering technology can be used to manufacture various metal compound thin film materials, which can be used to prepare various metal parts, molds and electronic components. For example, it can manufacture metal wires, electrodes, metal films, nanowires, and magnetoelectric devices. These materials are widely used in industry, electronics, and biomedicine.
Optical field: DC magnetron sputtering technology can be used to manufacture various optical films, such as anti-reflection coatings, reflective films, filters, etc. These films are widely used in optical instruments, lighting, photography and other fields.
Solar panel manufacturing: DC magnetron sputtering technology can be used to manufacture solar panels, which can convert light energy into electrical energy when illuminated by sunlight.
Decoration and construction fields: DC magnetron sputtering technology can be used to produce various decorative films, such as coated glass, plastic films, etc. These materials can be used for exterior decoration and interior decoration of buildings.
Electronic component manufacturing: DC magnetron sputtering technology can be used to manufacture various electronic components, such as resistors, capacitors, inductors, etc. These components play an important role in electronic equipment.
Technical parameters:
Model | Power (kW) | Max work current (A) | Dimensions | Cooling method | No-load voltage (V) | Working voltage (V) |
MSD-500W | 0.5kW | 1.0 | 482*132*440 (WHD)[3U] | Air cooling | 750 | 100~500V |
MSD-1000W | 1kW | 2.0 | ||||
MSD-2000W | 2kW | 4.0 | ||||
MSD-5kW | 5kW | 8.0 | 482*175*550 (WHD)[4U] | Air cooling | 1000 | 150~800V |
MSD series low power DC magnetron sputtering power supply
Main features:
1. It uses advanced current-mode switching power supply technology to reduce output energy storage components. At the same time, it improves the suppression of sparking and restart speed, and the advantage of coating on aluminum target is more obvious.
2. It is available in constant current/constant power mode. The constant power mode guarantees the repeatability of the coating process compared to the conventional constant current mode.
3. It has an ideal voltage steep drop characteristic, automatically recognizes the phenomenon of pseudo-ignition, and fully satisfies the continuity of the magnetron sputtering process.
4. Optional manual control / analog interface control, optional RS485 communication interface.
5. This power supply is specially customized for experimental vacuum equipment. Compared with the DC magnetron sputtering power supply of production equipment, it can reduce the power supply volume and reduce the cost for customers.
Using advanced PWM pulse width modulation technology, using imported IGBT or MOSFET as power switching device, it is small in size, light in weight, full in function, stable and reliable in performance, and the production process is strict and perfect.
This series of products uses advanced DSP control system to fully ensure the repeatability of the coating process, and has the function of restraining target arcing discharge and resisting short circuit.
This series of products has excellent load matching capability, which not only ensures the stability of the target surface cleaning process, but also improves the target surface cleaning speed;
The main parameters can be continuously adjusted in a wide range;
Easy maintenance and high reliability;
PLC interface and RS485 interface expansion function, easy to achieve automatic control.
DC magnetron sputtering power supply is a common thin film preparation technology. Its application fields include but are not limited to:
Manufacturing of metal compound thin film materials: DC magnetron sputtering technology can be used to manufacture various metal compound thin film materials, which can be used to prepare various metal parts, molds and electronic components. For example, it can manufacture metal wires, electrodes, metal films, nanowires, and magnetoelectric devices. These materials are widely used in industry, electronics, and biomedicine.
Optical field: DC magnetron sputtering technology can be used to manufacture various optical films, such as anti-reflection coatings, reflective films, filters, etc. These films are widely used in optical instruments, lighting, photography and other fields.
Solar panel manufacturing: DC magnetron sputtering technology can be used to manufacture solar panels, which can convert light energy into electrical energy when illuminated by sunlight.
Decoration and construction fields: DC magnetron sputtering technology can be used to produce various decorative films, such as coated glass, plastic films, etc. These materials can be used for exterior decoration and interior decoration of buildings.
Electronic component manufacturing: DC magnetron sputtering technology can be used to manufacture various electronic components, such as resistors, capacitors, inductors, etc. These components play an important role in electronic equipment.
Technical parameters:
Model | Power (kW) | Max work current (A) | Dimensions | Cooling method | No-load voltage (V) | Working voltage (V) |
MSD-500W | 0.5kW | 1.0 | 482*132*440 (WHD)[3U] | Air cooling | 750 | 100~500V |
MSD-1000W | 1kW | 2.0 | ||||
MSD-2000W | 2kW | 4.0 | ||||
MSD-5kW | 5kW | 8.0 | 482*175*550 (WHD)[4U] | Air cooling | 1000 | 150~800V |