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Gadolinium (Gd) Sputtering Targets

sputtering targets, evaporation sources and other deposition materials
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Introducing our Gadolinium (Gd) Sputtering Targets - the epitome of excellence in the field of deposition materials. Designed to meet the highest industry standards, our sputtering targets offer unparalleled performance and reliability for various applications.


Crafted with precision, our Gadolinium (Gd) Sputtering Targets are ideal for use in sputtering systems, ensuring efficient and uniform deposition of thin films. Whether you're working in the semiconductor, optical coating, or thin film research industry, our sputtering targets guarantee exceptional results every time.


Not limited to sputtering targets, we also provide evaporation sources and a wide range of other deposition materials to cater to your specific needs. Our vast selection ensures that you have access to the best materials for your deposition processes, enabling you to achieve the desired outcomes with utmost precision.


With a commitment to quality, our Gadolinium (Gd) Sputtering Targets undergo rigorous testing and quality control measures to ensure their durability and performance. We understand the importance of reliable materials in your research and production processes, and our products are designed to deliver consistent and reproducible results.


Partnering with us means gaining access to cutting-edge technology, exceptional customer support, and a vast knowledge base. Our team of experts is dedicated to assisting you in selecting the most suitable deposition materials for your unique requirements.


Choose our Gadolinium (Gd) Sputtering Targets for superior performance, unmatched reliability, and a seamless deposition process. Experience the difference that our professional-grade products can make in your research, development, and production endeavors.

Gadolinium (Gd) Specifications:

Material Type

Gadolinium †

Symbol

Gd

Atomic Weight

157.25

Atomic Number

64

Color/Appearance

Silvery White, Metallic

Thermal Conductivity

11 W/m.K

Melting Point (°C)

1,313

Coefficient of Thermal   Expansion

9.4 x 10-6/K

Theoretical Density (g/cc)

7.9

Ferromagnetic

Magnetic Material

Z Ratio

0.67

Sputter

DC

Max Power Density

(Watts/Square Inch)

20*

UN Number

2813


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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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