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Introducing our high-quality Barium Titanate (BaTiO3) Sputtering Targets, designed to meet your deposition material needs.
These sputtering targets are meticulously crafted to ensure exceptional performance and reliability in various applications. Whether you require sputtering targets, evaporation sources, or any other deposition materials, our Barium Titanate (BaTiO3) Sputtering Targets are the perfect choice.
Manufactured with utmost precision, our sputtering targets offer excellent uniformity, purity, and durability. With their professional-grade composition, they guarantee optimal results in thin film deposition processes.
Our Barium Titanate (BaTiO3) Sputtering Targets are engineered to deliver superior electrical and optical properties, making them ideal for applications in semiconductors, electronics, and optical coatings. Their exceptional thermal stability ensures consistent performance even under demanding conditions.
Furthermore, our products undergo rigorous quality control measures to meet the highest industry standards. Each sputtering target is carefully inspected to ensure flawless surfaces and precise dimensions, guaranteeing seamless integration into your deposition systems.
With our commitment to providing top-notch deposition materials, you can trust our Barium Titanate (BaTiO3) Sputtering Targets to enhance your thin film deposition processes. Experience the reliability and efficiency that our professional-grade products offer.
Contact us today to learn more about our Barium Titanate (BaTiO3) Sputtering Targets and how they can elevate your deposition processes to new heights.
Barium Titanate (BaTiO3) Sputtering Targets Specifications:
Material Type | Barium Titanate |
Symbol | BaTiO3 |
Melting Point (°C) | 1,625 |
Theoretical Density (g/cc) | 6.02 |
Z Ratio | 0.464 |
Sputter | RF |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Elastomer |
Comments | Gives Ba. Co-evap and Sputter OK. |
Introducing our high-quality Barium Titanate (BaTiO3) Sputtering Targets, designed to meet your deposition material needs.
These sputtering targets are meticulously crafted to ensure exceptional performance and reliability in various applications. Whether you require sputtering targets, evaporation sources, or any other deposition materials, our Barium Titanate (BaTiO3) Sputtering Targets are the perfect choice.
Manufactured with utmost precision, our sputtering targets offer excellent uniformity, purity, and durability. With their professional-grade composition, they guarantee optimal results in thin film deposition processes.
Our Barium Titanate (BaTiO3) Sputtering Targets are engineered to deliver superior electrical and optical properties, making them ideal for applications in semiconductors, electronics, and optical coatings. Their exceptional thermal stability ensures consistent performance even under demanding conditions.
Furthermore, our products undergo rigorous quality control measures to meet the highest industry standards. Each sputtering target is carefully inspected to ensure flawless surfaces and precise dimensions, guaranteeing seamless integration into your deposition systems.
With our commitment to providing top-notch deposition materials, you can trust our Barium Titanate (BaTiO3) Sputtering Targets to enhance your thin film deposition processes. Experience the reliability and efficiency that our professional-grade products offer.
Contact us today to learn more about our Barium Titanate (BaTiO3) Sputtering Targets and how they can elevate your deposition processes to new heights.
Barium Titanate (BaTiO3) Sputtering Targets Specifications:
Material Type | Barium Titanate |
Symbol | BaTiO3 |
Melting Point (°C) | 1,625 |
Theoretical Density (g/cc) | 6.02 |
Z Ratio | 0.464 |
Sputter | RF |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Elastomer |
Comments | Gives Ba. Co-evap and Sputter OK. |
