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Cobalt (Co) Sputtering Targets

sputtering targets, evaporation sources and other deposition materials
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Introducing our Cobalt (Co) Sputtering Targets, the ultimate solution for your sputtering and deposition needs. With our professional-grade products, we provide you with top-quality sputtering targets, evaporation sources, and other deposition materials.


Our Cobalt (Co) Sputtering Targets are meticulously engineered to deliver exceptional performance and reliability in various deposition processes. Crafted with utmost precision, these targets ensure uniformity and consistency, allowing you to achieve precise and accurate thin film coatings.


Designed to meet the demands of advanced thin film applications, our Cobalt (Co) Sputtering Targets offer excellent thermal conductivity and high melting point, making them ideal for applications in electronics, optics, and magnetic storage media. Whether you are working on semiconductor devices, solar cells, or magnetic films, our sputtering targets will provide you with superior results.


Not only do our Cobalt (Co) Sputtering Targets excel in performance, but they also boast exceptional durability and longevity. Manufactured using high-quality materials, our targets are resistant to wear and corrosion, ensuring extended usage and minimizing downtime.


At [Company Name], we understand the importance of reliable and consistent deposition materials for your research, development, and production processes. That's why we have dedicated ourselves to delivering the highest standard of products that meet your specific requirements.


Choose our Cobalt (Co) Sputtering Targets for their exceptional quality, reliability, and performance. Trust in our expertise and experience to provide you with the deposition materials you need to achieve outstanding results in your thin film applications.

Cobalt (Co) Specifications:

Material Type

Cobalt †

Symbol

Co

Atomic Weight

58.9332

Atomic Number

27

Color/Appearance

Lustrous, Metallic, Grayish   Tinge

Thermal Conductivity

100 W/m.K

Melting Point (°C)

1,495

Coefficient of Thermal   Expansion

13.0 x 10-6/K

Theoretical Density (g/cc)

8.9

Ferromagnetic

Magnetic Material

Z Ratio

0.343

Sputter

DC

Max Power Density

(Watts/Square Inch)

80*

Comments

Alloys with W/Ta/Mo.


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Zhengzhou Tainuo Thin Film Materials Co., Ltd.
Which is a manufacturer specializing in the production of laboratory scientific instruments. Our products are widely used in colleges, research institutions and laboratories.

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