| Quantity: | |
|---|---|
TN
Introducing our high-quality Chromium (Cr) Sputtering Targets, specifically designed for various sputtering and deposition applications. With a professional tone of voice, we aim to provide you with a comprehensive product description that highlights the features and benefits of our Chromium Sputtering Targets.
Our Chromium Sputtering Targets are meticulously manufactured using advanced techniques and state-of-the-art equipment, ensuring exceptional purity and uniformity. These targets are specifically engineered to meet the demanding requirements of sputtering processes, delivering consistent and reliable performance.
With a wide range of applications in thin film deposition, our Chromium Sputtering Targets are suitable for use in industries such as semiconductor, optics, electronics, and solar energy. These targets are ideal for sputtering systems, evaporation sources, and other deposition processes.
The key features of our Chromium Sputtering Targets include their high density, excellent adhesion, and superior film quality. These targets possess outstanding thermal conductivity, enabling efficient heat dissipation during the sputtering process. Moreover, their exceptional purity ensures minimal impurities in the deposited films, resulting in enhanced film properties and overall performance.
Our Chromium Sputtering Targets are available in various sizes and configurations to cater to your specific requirements. Whether you need circular, rectangular, or custom-shaped targets, we can provide you with tailored solutions to meet your deposition needs.
At [Company Name], we prioritize customer satisfaction and strive to deliver products of the highest quality. Our Chromium Sputtering Targets undergo rigorous quality control measures to ensure consistent performance and durability. Additionally, our team of experts is always ready to provide technical support and guidance, ensuring a seamless integration of our products into your deposition processes.
Invest in our Chromium Sputtering Targets and experience the superior performance and reliability they offer. With our commitment to excellence and professionalism, we aim to be your trusted partner in thin film deposition materials. Contact us today to discuss your specific requirements and let us assist you in achieving your deposition goals.
Chromium (Cr) Specifications：
Material Type | Chromium |
Symbol | Cr |
Atomic Weight | 51.9961 |
Atomic Number | 24 |
Color/Appearance | Silvery, Metallic |
Thermal Conductivity | 94 W/m.K |
Melting Point (°C) | 1,857 |
Coefficient of Thermal Expansion | 4.9 x 10-6/K |
Theoretical Density (g/cc) | 7.2 |
Z Ratio | 0.305 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 80* |
Type of Bond | Indium, Elastomer |
Comments | Films very adherent. High rates possible. |
Introducing our high-quality Chromium (Cr) Sputtering Targets, specifically designed for various sputtering and deposition applications. With a professional tone of voice, we aim to provide you with a comprehensive product description that highlights the features and benefits of our Chromium Sputtering Targets.
Our Chromium Sputtering Targets are meticulously manufactured using advanced techniques and state-of-the-art equipment, ensuring exceptional purity and uniformity. These targets are specifically engineered to meet the demanding requirements of sputtering processes, delivering consistent and reliable performance.
With a wide range of applications in thin film deposition, our Chromium Sputtering Targets are suitable for use in industries such as semiconductor, optics, electronics, and solar energy. These targets are ideal for sputtering systems, evaporation sources, and other deposition processes.
The key features of our Chromium Sputtering Targets include their high density, excellent adhesion, and superior film quality. These targets possess outstanding thermal conductivity, enabling efficient heat dissipation during the sputtering process. Moreover, their exceptional purity ensures minimal impurities in the deposited films, resulting in enhanced film properties and overall performance.
Our Chromium Sputtering Targets are available in various sizes and configurations to cater to your specific requirements. Whether you need circular, rectangular, or custom-shaped targets, we can provide you with tailored solutions to meet your deposition needs.
At [Company Name], we prioritize customer satisfaction and strive to deliver products of the highest quality. Our Chromium Sputtering Targets undergo rigorous quality control measures to ensure consistent performance and durability. Additionally, our team of experts is always ready to provide technical support and guidance, ensuring a seamless integration of our products into your deposition processes.
Invest in our Chromium Sputtering Targets and experience the superior performance and reliability they offer. With our commitment to excellence and professionalism, we aim to be your trusted partner in thin film deposition materials. Contact us today to discuss your specific requirements and let us assist you in achieving your deposition goals.
Chromium (Cr) Specifications：
Material Type | Chromium |
Symbol | Cr |
Atomic Weight | 51.9961 |
Atomic Number | 24 |
Color/Appearance | Silvery, Metallic |
Thermal Conductivity | 94 W/m.K |
Melting Point (°C) | 1,857 |
Coefficient of Thermal Expansion | 4.9 x 10-6/K |
Theoretical Density (g/cc) | 7.2 |
Z Ratio | 0.305 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 80* |
Type of Bond | Indium, Elastomer |
Comments | Films very adherent. High rates possible. |
