| Quantity: | |
|---|---|
TN
Introducing our top-of-the-line Carbon (Pyrolytic Graphite) (C) Sputtering Targets, the ultimate solution for all your sputtering and deposition needs.
Crafted with precision and expertise, our sputtering targets are designed to deliver exceptional performance and reliability. Whether you require high-quality evaporation sources or other deposition materials, our Carbon (Pyrolytic Graphite) (C) Sputtering Targets are the perfect choice for professionals like you.
Our sputtering targets are meticulously manufactured using advanced techniques, ensuring superior purity and consistent composition. With their exceptional thermal conductivity and excellent electrical properties, these targets guarantee optimal deposition results, allowing you to achieve precise thin film coatings with utmost efficiency.
Designed to meet the highest industry standards, our Carbon (Pyrolytic Graphite) (C) Sputtering Targets offer excellent stability and durability during the sputtering process. Their robust construction ensures prolonged usage, reducing downtime and increasing productivity in your deposition applications.
When it comes to deposition materials, we understand the importance of reliability and performance. That's why our Carbon (Pyrolytic Graphite) (C) Sputtering Targets are meticulously tested and inspected to ensure they meet the strictest quality control standards. You can trust our products to consistently deliver exceptional results, allowing you to achieve the desired thin film characteristics with precision and accuracy.
Invest in our Carbon (Pyrolytic Graphite) (C) Sputtering Targets and experience the difference in your sputtering and deposition processes. With their exceptional features and professional-grade quality, these targets are the perfect choice for professionals like you who demand nothing but the best. Elevate your thin film coating applications to new heights with our top-of-the-line sputtering targets, evaporation sources, and other deposition materials.
Carbon (Pyrolytic Graphite) (C) Specifications
Material Type | Carbon |
Symbol | C |
Atomic Weight | 12.0107 |
Atomic Number | 6 |
Color/Appearance | Black, Non-Metallic |
Thermal Conductivity | 140 W/m.K |
Melting Point (°C) | ~3,652 |
Coefficient of Thermal Expansion | 7.1 x 10-6/K |
Theoretical Density (g/cc) | 2.25 |
Z Ratio | 3.26 |
Sputter | PDC |
Max Power Density (Watts/Square Inch) | 80* |
Type of Bond | Indium, Elastomer |
Comments | E-beam preferred. Arc evaporation. Poor film adhesion. |
Introducing our top-of-the-line Carbon (Pyrolytic Graphite) (C) Sputtering Targets, the ultimate solution for all your sputtering and deposition needs.
Crafted with precision and expertise, our sputtering targets are designed to deliver exceptional performance and reliability. Whether you require high-quality evaporation sources or other deposition materials, our Carbon (Pyrolytic Graphite) (C) Sputtering Targets are the perfect choice for professionals like you.
Our sputtering targets are meticulously manufactured using advanced techniques, ensuring superior purity and consistent composition. With their exceptional thermal conductivity and excellent electrical properties, these targets guarantee optimal deposition results, allowing you to achieve precise thin film coatings with utmost efficiency.
Designed to meet the highest industry standards, our Carbon (Pyrolytic Graphite) (C) Sputtering Targets offer excellent stability and durability during the sputtering process. Their robust construction ensures prolonged usage, reducing downtime and increasing productivity in your deposition applications.
When it comes to deposition materials, we understand the importance of reliability and performance. That's why our Carbon (Pyrolytic Graphite) (C) Sputtering Targets are meticulously tested and inspected to ensure they meet the strictest quality control standards. You can trust our products to consistently deliver exceptional results, allowing you to achieve the desired thin film characteristics with precision and accuracy.
Invest in our Carbon (Pyrolytic Graphite) (C) Sputtering Targets and experience the difference in your sputtering and deposition processes. With their exceptional features and professional-grade quality, these targets are the perfect choice for professionals like you who demand nothing but the best. Elevate your thin film coating applications to new heights with our top-of-the-line sputtering targets, evaporation sources, and other deposition materials.
Carbon (Pyrolytic Graphite) (C) Specifications
Material Type | Carbon |
Symbol | C |
Atomic Weight | 12.0107 |
Atomic Number | 6 |
Color/Appearance | Black, Non-Metallic |
Thermal Conductivity | 140 W/m.K |
Melting Point (°C) | ~3,652 |
Coefficient of Thermal Expansion | 7.1 x 10-6/K |
Theoretical Density (g/cc) | 2.25 |
Z Ratio | 3.26 |
Sputter | PDC |
Max Power Density (Watts/Square Inch) | 80* |
Type of Bond | Indium, Elastomer |
Comments | E-beam preferred. Arc evaporation. Poor film adhesion. |
