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Introducing our Boron (B) Sputtering Targets - the epitome of excellence in sputtering targets, evaporation sources, and other deposition materials.
Crafted with precision and designed to meet the highest industry standards, our Boron (B) Sputtering Targets are the ideal choice for a wide range of applications.
With exceptional purity and uniformity, our sputtering targets ensure optimal performance and consistent results. The high-quality materials used in their production guarantee long-lasting durability and reliability, making them a cost-effective investment for your projects.
Our Boron (B) Sputtering Targets are meticulously engineered to deliver exceptional deposition rates, enabling efficient and precise thin film coatings. Whether you are working in the semiconductor, optical, or solar industries, our sputtering targets are tailored to meet your specific needs.
Backed by our commitment to quality, our Boron (B) Sputtering Targets undergo rigorous testing and quality control measures to ensure they meet the strictest specifications. With our products, you can trust that your deposition processes will be carried out with utmost accuracy and efficiency.
Choose our Boron (B) Sputtering Targets for unparalleled performance and reliability. Elevate your thin film deposition processes with our industry-leading products. Experience the difference in quality and precision that our sputtering targets bring to your projects.
Boron (B) Sputtering Targets Specifications：
Material Type | Boron |
Symbol | B |
Atomic Weight | 10.811 |
Atomic Number | 5 |
Color/Appearance | Black, Semi-metallic |
Thermal Conductivity | 27 W/m.K |
Melting Point (°C) | 2,079 |
Coefficient of Thermal Expansion | 6 x 10-6/K |
Theoretical Density (g/cc) | 2.34 |
Z Ratio | 0.389 |
Sputter | RF |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium |
Comments | Explodes with rapid cooling. Forms carbide with container. |
Introducing our Boron (B) Sputtering Targets - the epitome of excellence in sputtering targets, evaporation sources, and other deposition materials.
Crafted with precision and designed to meet the highest industry standards, our Boron (B) Sputtering Targets are the ideal choice for a wide range of applications.
With exceptional purity and uniformity, our sputtering targets ensure optimal performance and consistent results. The high-quality materials used in their production guarantee long-lasting durability and reliability, making them a cost-effective investment for your projects.
Our Boron (B) Sputtering Targets are meticulously engineered to deliver exceptional deposition rates, enabling efficient and precise thin film coatings. Whether you are working in the semiconductor, optical, or solar industries, our sputtering targets are tailored to meet your specific needs.
Backed by our commitment to quality, our Boron (B) Sputtering Targets undergo rigorous testing and quality control measures to ensure they meet the strictest specifications. With our products, you can trust that your deposition processes will be carried out with utmost accuracy and efficiency.
Choose our Boron (B) Sputtering Targets for unparalleled performance and reliability. Elevate your thin film deposition processes with our industry-leading products. Experience the difference in quality and precision that our sputtering targets bring to your projects.
Boron (B) Sputtering Targets Specifications：
Material Type | Boron |
Symbol | B |
Atomic Weight | 10.811 |
Atomic Number | 5 |
Color/Appearance | Black, Semi-metallic |
Thermal Conductivity | 27 W/m.K |
Melting Point (°C) | 2,079 |
Coefficient of Thermal Expansion | 6 x 10-6/K |
Theoretical Density (g/cc) | 2.34 |
Z Ratio | 0.389 |
Sputter | RF |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium |
Comments | Explodes with rapid cooling. Forms carbide with container. |
