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Introducing our top-of-the-line Bismuth (Bi) Sputtering Targets, designed to meet the highest standards of the industry. These sputtering targets are meticulously crafted to provide exceptional performance and reliability, making them an ideal choice for various deposition applications.
Our Bismuth Sputtering Targets are specifically engineered to deliver precise and uniform film deposition. With their exceptional purity and consistency, they ensure superior film quality and adherence, resulting in enhanced product performance.
In addition to sputtering targets, we offer a comprehensive range of evaporation sources and other deposition materials to cater to diverse customer needs. Our extensive selection guarantees that you will find the perfect solution for your specific application requirements.
Crafted with utmost precision, our Bismuth Sputtering Targets are made from high-quality materials, ensuring durability and longevity. Each target undergoes rigorous quality checks to guarantee superior performance, making them a reliable choice for your deposition processes.
With our commitment to delivering excellence, we prioritize customer satisfaction by providing products that exceed expectations. Our team of experts is dedicated to assisting you in finding the most suitable deposition materials for your unique requirements.
Choose our Bismuth (Bi) Sputtering Targets for exceptional quality, reliability, and outstanding performance. Experience the difference that our products can make in your deposition processes. Trust in our professional-grade solutions to elevate your results to new heights.
Bismuth (Bi) Sputtering Targets Specifications:
Material Type | Bismuth |
Symbol | Bi |
Atomic Weight | 208.9804 |
Atomic Number | 83 |
Color/Appearance | Lustrous Reddish White, Metallic |
Thermal Conductivity | 8 W/m.K |
Melting Point (°C) | 271 |
Coefficient of Thermal Expansion | 13.4 x 10-6/K |
Theoretical Density (g/cc) | 9.8 |
Z Ratio | 0.79 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 10* |
Type of Bond | Indium, Elastomer |
Export Control (ECCN) | 1C229 |
Comments | Resistivity high. Low Melting Point materials not ideal for sputtering. |
Introducing our top-of-the-line Bismuth (Bi) Sputtering Targets, designed to meet the highest standards of the industry. These sputtering targets are meticulously crafted to provide exceptional performance and reliability, making them an ideal choice for various deposition applications.
Our Bismuth Sputtering Targets are specifically engineered to deliver precise and uniform film deposition. With their exceptional purity and consistency, they ensure superior film quality and adherence, resulting in enhanced product performance.
In addition to sputtering targets, we offer a comprehensive range of evaporation sources and other deposition materials to cater to diverse customer needs. Our extensive selection guarantees that you will find the perfect solution for your specific application requirements.
Crafted with utmost precision, our Bismuth Sputtering Targets are made from high-quality materials, ensuring durability and longevity. Each target undergoes rigorous quality checks to guarantee superior performance, making them a reliable choice for your deposition processes.
With our commitment to delivering excellence, we prioritize customer satisfaction by providing products that exceed expectations. Our team of experts is dedicated to assisting you in finding the most suitable deposition materials for your unique requirements.
Choose our Bismuth (Bi) Sputtering Targets for exceptional quality, reliability, and outstanding performance. Experience the difference that our products can make in your deposition processes. Trust in our professional-grade solutions to elevate your results to new heights.
Bismuth (Bi) Sputtering Targets Specifications:
Material Type | Bismuth |
Symbol | Bi |
Atomic Weight | 208.9804 |
Atomic Number | 83 |
Color/Appearance | Lustrous Reddish White, Metallic |
Thermal Conductivity | 8 W/m.K |
Melting Point (°C) | 271 |
Coefficient of Thermal Expansion | 13.4 x 10-6/K |
Theoretical Density (g/cc) | 9.8 |
Z Ratio | 0.79 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 10* |
Type of Bond | Indium, Elastomer |
Export Control (ECCN) | 1C229 |
Comments | Resistivity high. Low Melting Point materials not ideal for sputtering. |