Aluminum Silicon (Al,Si, 99/1 Wt%) Sputtering Targets

Introducing our high-quality Aluminum Silicon (Al,Si, 99/1 wt%) Sputtering Targets! Designed for use in various deposition processes, these sputtering targets are crafted to meet the demands of professionals in the industry.

Our Aluminum Silicon Sputtering Targets are manufactured using premium-grade materials, ensuring exceptional purity and consistency. With a composition of 99% aluminum and 1% silicon by weight, these targets offer superior performance and reliability.

These targets are specifically engineered for sputtering applications, making them ideal for thin film deposition processes. They can also be used as evaporation sources and other deposition materials, providing versatility and flexibility in your manufacturing processes.

Our Aluminum Silicon Sputtering Targets are known for their excellent thermal conductivity, high melting point, and outstanding corrosion resistance. These features make them highly durable and capable of withstanding demanding operating conditions.

With our commitment to delivering top-notch products, our Aluminum Silicon Sputtering Targets undergo rigorous quality control measures. We ensure that each target meets strict industry standards, guaranteeing consistent performance and reliability.

Choose our Aluminum Silicon (Al,Si, 99/1 wt%) Sputtering Targets for your deposition needs and experience the difference in quality and performance. Trust in our professional-grade products to enhance your manufacturing processes and achieve exceptional results.

Sputtering Targets Model size: