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Aluminum Oxide (Al2O3) Sputtering Targets Overview

Aluminum Oxide (Al2O3) Sputtering Targets Overview is evaporated under vacuum to form dielectric films for the semiconductor industry and as a mirror-like protective layer for optical coatings
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Aluminum oxide, or more commonly called alumina, is a chemical compound with a chemical formula of Al2O3. It is generally white or clear in appearance with a melting point of 2,072°C, a vapor pressure of 10-4 Torr at 1,550°C, and a density of 3.97 g/cc. It is most commonly found in nature as the mineral corundum, from which ruby and sapphire are derived. Aluminum oxide is used extensively as an abrasive and is utilized in various industrial applications. It can also be found in paint, cosmetics, and surgical implants. It is evaporated under vacuum to form dielectric films for the semiconductor industry and as a mirror-like protective layer for optical coatings.

Aluminum Oxide (Al2O3) Specifications:

Material Type

Aluminum Oxide

Symbol

Al2O3

Color/Appearance

White, Crystalline Solid

Melting Point (°C)

2,072

Theoretical Density (g/cc)

3.97

Z Ratio

0.336

Sputter

RF-R

Max Power Density

(Watts/Square Inch)

20*

Type of Bond

Indium, Elastomer

Sapphire excellent in E

beam; forms smooth, hard films.  Thermal evaporation likely   not possible


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