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Introducing our top-quality Zirconium Oxide (ZrO2, Fully stabilized 8mol% Y2O3) Sputtering Targets – the ultimate choice for your sputtering targets, evaporation sources, and other deposition material needs.
Crafted with utmost precision and expertise, our Zirconium Oxide Sputtering Targets offer exceptional performance and reliability. These targets are manufactured using fully stabilized 8mol% Y2O3, ensuring superior stability and durability during the sputtering process.
Designed to meet the demands of various applications, our sputtering targets are engineered to deliver consistent and uniform film deposition. With their high purity and excellent thermal conductivity, these targets guarantee optimal results in thin film deposition processes.
Our Zirconium Oxide Sputtering Targets are meticulously fabricated to provide a smooth and defect-free surface, enabling efficient and accurate material deposition. The exceptional quality and purity of our targets ensure minimal contamination, allowing for precise control over the deposition process.
Whether you require sputtering targets, evaporation sources, or other deposition materials, our Zirconium Oxide Sputtering Targets are the perfect choice. With their exceptional performance, reliability, and compatibility with various deposition techniques, these targets are ideal for applications in semiconductor, optical, and thin film industries.
Trust in our professional-grade Zirconium Oxide Sputtering Targets to enhance your deposition processes and achieve superior results. Invest in the best and experience the difference in performance and quality.
Zirconium Oxide (ZrO2, Fully stabilized 8mol% Y2O3) Specifications
Material Type | Zirconium Oxide |
Symbol | ZrO2 |
Color/Appearance | White, Solid |
Melting Point (°C) | ~2,700 |
Theoretical Density (g/cc) | 5.89 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Export Control (ECCN) | 1C234 |
Comments | Films oxygen deficient, clear and hard. |
Introducing our top-quality Zirconium Oxide (ZrO2, Fully stabilized 8mol% Y2O3) Sputtering Targets – the ultimate choice for your sputtering targets, evaporation sources, and other deposition material needs.
Crafted with utmost precision and expertise, our Zirconium Oxide Sputtering Targets offer exceptional performance and reliability. These targets are manufactured using fully stabilized 8mol% Y2O3, ensuring superior stability and durability during the sputtering process.
Designed to meet the demands of various applications, our sputtering targets are engineered to deliver consistent and uniform film deposition. With their high purity and excellent thermal conductivity, these targets guarantee optimal results in thin film deposition processes.
Our Zirconium Oxide Sputtering Targets are meticulously fabricated to provide a smooth and defect-free surface, enabling efficient and accurate material deposition. The exceptional quality and purity of our targets ensure minimal contamination, allowing for precise control over the deposition process.
Whether you require sputtering targets, evaporation sources, or other deposition materials, our Zirconium Oxide Sputtering Targets are the perfect choice. With their exceptional performance, reliability, and compatibility with various deposition techniques, these targets are ideal for applications in semiconductor, optical, and thin film industries.
Trust in our professional-grade Zirconium Oxide Sputtering Targets to enhance your deposition processes and achieve superior results. Invest in the best and experience the difference in performance and quality.
Zirconium Oxide (ZrO2, Fully stabilized 8mol% Y2O3) Specifications
Material Type | Zirconium Oxide |
Symbol | ZrO2 |
Color/Appearance | White, Solid |
Melting Point (°C) | ~2,700 |
Theoretical Density (g/cc) | 5.89 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Export Control (ECCN) | 1C234 |
Comments | Films oxygen deficient, clear and hard. |
