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Introducing our high-quality Indium Tin Oxide (ITO) Sputtering Targets, the ideal choice for sputtering targets, evaporation sources, and other deposition materials.
Crafted with precision, our ITO Sputtering Targets consist of a composition of In2O3SnO2 with a weight ratio of 90:10. This unique blend ensures exceptional performance and reliability in various thin film deposition processes.
With our ITO Sputtering Targets, you can achieve superior film quality, excellent electrical conductivity, and outstanding optical properties. These targets are specifically designed to meet the demanding requirements of industries such as electronics, solar cells, touch screens, and more.
Our commitment to quality is reflected in the exceptional purity of our ITO Sputtering Targets, ensuring minimal impurities and uniformity throughout the material. This guarantees consistent and repeatable results, enhancing the efficiency of your deposition processes.
Manufactured using advanced techniques, our ITO Sputtering Targets exhibit excellent thermal stability, enabling prolonged usage without compromising performance. The precise dimensions and surface finish of our targets allow for easy installation and efficient sputtering, reducing downtime and maximizing productivity.
Choose our ITO Sputtering Targets for their exceptional performance, reliability, and consistent film quality. Trust in our expertise and experience to meet your specific thin film deposition needs. Contact us today to learn more about our comprehensive range of sputtering targets, evaporation sources, and other deposition materials.
Indium Tin Oxide, ITO (In2O3/SnO2 90/10 wt %) Specifications:
Material Type | Indium Tin Oxide |
Symbol | In2O3/SnO2 90/10 wt % |
Melting Point (°C) | 1,800 |
Theoretical Density (g/cc) | 7.14 |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
Introducing our high-quality Indium Tin Oxide (ITO) Sputtering Targets, the ideal choice for sputtering targets, evaporation sources, and other deposition materials.
Crafted with precision, our ITO Sputtering Targets consist of a composition of In2O3SnO2 with a weight ratio of 90:10. This unique blend ensures exceptional performance and reliability in various thin film deposition processes.
With our ITO Sputtering Targets, you can achieve superior film quality, excellent electrical conductivity, and outstanding optical properties. These targets are specifically designed to meet the demanding requirements of industries such as electronics, solar cells, touch screens, and more.
Our commitment to quality is reflected in the exceptional purity of our ITO Sputtering Targets, ensuring minimal impurities and uniformity throughout the material. This guarantees consistent and repeatable results, enhancing the efficiency of your deposition processes.
Manufactured using advanced techniques, our ITO Sputtering Targets exhibit excellent thermal stability, enabling prolonged usage without compromising performance. The precise dimensions and surface finish of our targets allow for easy installation and efficient sputtering, reducing downtime and maximizing productivity.
Choose our ITO Sputtering Targets for their exceptional performance, reliability, and consistent film quality. Trust in our expertise and experience to meet your specific thin film deposition needs. Contact us today to learn more about our comprehensive range of sputtering targets, evaporation sources, and other deposition materials.
Indium Tin Oxide, ITO (In2O3/SnO2 90/10 wt %) Specifications:
Material Type | Indium Tin Oxide |
Symbol | In2O3/SnO2 90/10 wt % |
Melting Point (°C) | 1,800 |
Theoretical Density (g/cc) | 7.14 |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Indium, Elastomer |
