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Introducing our Indium (In) Sputtering Targets - the epitome of excellence in sputtering targets, evaporation sources, and other deposition materials.
Crafted with utmost precision and expertise, our Indium (In) Sputtering Targets are designed to meet the demanding requirements of various industries.
These targets are ideal for use in physical vapor deposition (PVD) processes, where thin films are deposited onto substrates to create high-quality coatings. Our Indium (In) Sputtering Targets ensure uniform and controlled deposition, resulting in superior film quality and enhanced performance.
With exceptional purity and uniformity, our Indium (In) Sputtering Targets guarantee consistent and reliable results. They are meticulously manufactured using advanced techniques and high-quality materials, ensuring durability and longevity.
Our Indium (In) Sputtering Targets are extensively used in applications such as semiconductor fabrication, optical coatings, and thin film research. They offer excellent adhesion, high density, and excellent thermal conductivity, making them the preferred choice for various industries.
When it comes to deposition materials, our Indium (In) Sputtering Targets are a testament to professionalism and reliability. Trust in our products to deliver exceptional performance, impeccable quality, and unmatched precision.
Choose our Indium (In) Sputtering Targets for your sputtering and evaporation needs, and experience the pinnacle of excellence in deposition materials.
Indium (In) Specifications：
Material Type | Indium |
Symbol | In |
Atomic Weight | 114.818 |
Atomic Number | 49 |
Color/Appearance | Silvery Lustrous Gray, Metallic |
Thermal Conductivity | 82 W/m.K |
Melting Point (°C) | 157 |
Coefficient of Thermal Expansion | 32.1 x 10-6/K |
Theoretical Density (g/cc) | 7.3 |
Z Ratio | 0.841 |
Sputter | DC |
Type of Bond | Elastomer |
Comments | Wets W and Cu. Use Mo liner. Low Melting Point materials not ideal for sputtering. |
Introducing our Indium (In) Sputtering Targets - the epitome of excellence in sputtering targets, evaporation sources, and other deposition materials.
Crafted with utmost precision and expertise, our Indium (In) Sputtering Targets are designed to meet the demanding requirements of various industries.
These targets are ideal for use in physical vapor deposition (PVD) processes, where thin films are deposited onto substrates to create high-quality coatings. Our Indium (In) Sputtering Targets ensure uniform and controlled deposition, resulting in superior film quality and enhanced performance.
With exceptional purity and uniformity, our Indium (In) Sputtering Targets guarantee consistent and reliable results. They are meticulously manufactured using advanced techniques and high-quality materials, ensuring durability and longevity.
Our Indium (In) Sputtering Targets are extensively used in applications such as semiconductor fabrication, optical coatings, and thin film research. They offer excellent adhesion, high density, and excellent thermal conductivity, making them the preferred choice for various industries.
When it comes to deposition materials, our Indium (In) Sputtering Targets are a testament to professionalism and reliability. Trust in our products to deliver exceptional performance, impeccable quality, and unmatched precision.
Choose our Indium (In) Sputtering Targets for your sputtering and evaporation needs, and experience the pinnacle of excellence in deposition materials.
Indium (In) Specifications：
Material Type | Indium |
Symbol | In |
Atomic Weight | 114.818 |
Atomic Number | 49 |
Color/Appearance | Silvery Lustrous Gray, Metallic |
Thermal Conductivity | 82 W/m.K |
Melting Point (°C) | 157 |
Coefficient of Thermal Expansion | 32.1 x 10-6/K |
Theoretical Density (g/cc) | 7.3 |
Z Ratio | 0.841 |
Sputter | DC |
Type of Bond | Elastomer |
Comments | Wets W and Cu. Use Mo liner. Low Melting Point materials not ideal for sputtering. |
