| Quantity: | |
|---|---|
TN-O1200-50IIT
TN
This product is a 1200℃ plasma enhanced hybrid physical chemical vapor deposition (HPCVD) dual heating zone rotary tube furnace system. The equipment includes a dual heating zone tube furnace, a set of tungsten filament evaporation source, a set of plasma generator and a set of mass flowmeter system. Its working principle is to evaporate the reactant at the gas inlet end through the evaporation source and load it into the heating zone of the tube furnace through the airflow to carry out the CVD reaction. At the same time, the reaction is promoted by plasma enhancement. It is suitable for the heat treatment of inorganic composite powder and the surface coating uniformity (e.g. prepare Li-Ion battery cathode powders with conductive coatings on sample surface).
Technical parameters:
Two heating zone tube furnace | Product model | TN-O1200-50IIT | |
Furnace tube material | High purity quartz | ||
Tube diameter | 50mm | ||
Furnace tube length | 1200mm | ||
Furnace chamber length | 440mm | ||
Heating zone length | 200mm+200mm | ||
Operating temperature | 0～1100℃ | ||
Temperature control accuracy | ±1℃ | ||
Temperature control mode | 30 or 50 segment program temperature control | ||
Display mode | HD full color LCD touch screen | ||
Sealing method | 304 stainless steel vacuum flange | ||
Power supply | AC: 220V 50/60Hz 2.5kw | ||
RF output system | Power range | 0~500W adjustable | |
working frequency | 13.56MHz+0.005% | ||
Working mode | Continuous output | ||
Matched impedance mode | It can be matched, and the glow is evenly distributed throughout the furnace tube | ||
Power stability | ≤2W | ||
Normal working reflected power | ≤3W | ||
Amplified reflected power | ≤70W | ||
Harmonic component | ≤-50dBc | ||
Overall efficiency | ≥70% | ||
Power Factor | ≥90% | ||
Supply voltage/frequency | Single-phase AC (187V~153V) frequency 50/60Hz | ||
Control mode | Internal control/PLC analog quantity/RS232/485 communication | ||
Power protection settings | DC over current protection, power amplifier over temperature protection, reflected power protection | ||
Cooling method | Forced air cooling | ||
Glow zone | Under Ar, the radio frequency power supply and the coil cooperate with the glow to fill the furnace tube | ||
Evaporation boat | Working temperature | 1300℃ | |
Evaporation source | Tungsten wire basket, optional tapered alumina crucible | ||
Thermocouple | S type thermocouple | ||
Working current | ≤30A | ||
Max. power | 500W | ||
Gas delivery system | Flowmeter | Four-channel mass flowmeter | |
Flow range | MFC1 range: 0~200sccm MFC2 range: 0~200sccm MFC3 range: 0~500sccm MFC4 range: 0~500sccm Corresponding to gases H2, CH4, N2, Ar. | ||
Measurement accuracy | ±1.5%F.S | ||
Repeatability | ±0.2%FS | ||
Linear accuracy | ±1%F.S. | ||
Response time | ≤4s | ||
Work pressure | -0.15Mpa~0.15Mpa | ||
Flow control | LCD touch screen control, digital display, each channel gas contains needle valve for individually control. | ||
Intake Interface | It can be connected with 1/4NPS or 6mm outer diameter stainless steel pipe | ||
Outlet Interface | It can be connected with 1/4NPS or 6mm outer diameter stainless steel pipe | ||
Connection method | Double ferrule connector | ||
Operating temperature | 5~45℃ | ||
Gas premix | Equipped with gas premixing device | ||
Exhaust system | Product model | CY-GZK103-A | |
Molecular pump | Turbomolecular pump | ||
Backing pump | Two-stage rotary vane pump | ||
Pumping rate | Molecular pump: 600L/S | Comprehensive pumping performance: 30 minutes vacuum can reach: 5×10E-3Pa | |
Rotary vane pump: 1.1L/S | |||
Ultimate vacuum | 5×10E-4Pa | ||
Pumping port | KF40 | ||
Exhaust interface | KF16 | ||
Vacuum measurement | Compound vacuum gauge | ||
This product is a 1200℃ plasma enhanced hybrid physical chemical vapor deposition (HPCVD) dual heating zone rotary tube furnace system. The equipment includes a dual heating zone tube furnace, a set of tungsten filament evaporation source, a set of plasma generator and a set of mass flowmeter system. Its working principle is to evaporate the reactant at the gas inlet end through the evaporation source and load it into the heating zone of the tube furnace through the airflow to carry out the CVD reaction. At the same time, the reaction is promoted by plasma enhancement. It is suitable for the heat treatment of inorganic composite powder and the surface coating uniformity (e.g. prepare Li-Ion battery cathode powders with conductive coatings on sample surface).
Technical parameters:
Two heating zone tube furnace | Product model | TN-O1200-50IIT | |
Furnace tube material | High purity quartz | ||
Tube diameter | 50mm | ||
Furnace tube length | 1200mm | ||
Furnace chamber length | 440mm | ||
Heating zone length | 200mm+200mm | ||
Operating temperature | 0～1100℃ | ||
Temperature control accuracy | ±1℃ | ||
Temperature control mode | 30 or 50 segment program temperature control | ||
Display mode | HD full color LCD touch screen | ||
Sealing method | 304 stainless steel vacuum flange | ||
Power supply | AC: 220V 50/60Hz 2.5kw | ||
RF output system | Power range | 0~500W adjustable | |
working frequency | 13.56MHz+0.005% | ||
Working mode | Continuous output | ||
Matched impedance mode | It can be matched, and the glow is evenly distributed throughout the furnace tube | ||
Power stability | ≤2W | ||
Normal working reflected power | ≤3W | ||
Amplified reflected power | ≤70W | ||
Harmonic component | ≤-50dBc | ||
Overall efficiency | ≥70% | ||
Power Factor | ≥90% | ||
Supply voltage/frequency | Single-phase AC (187V~153V) frequency 50/60Hz | ||
Control mode | Internal control/PLC analog quantity/RS232/485 communication | ||
Power protection settings | DC over current protection, power amplifier over temperature protection, reflected power protection | ||
Cooling method | Forced air cooling | ||
Glow zone | Under Ar, the radio frequency power supply and the coil cooperate with the glow to fill the furnace tube | ||
Evaporation boat | Working temperature | 1300℃ | |
Evaporation source | Tungsten wire basket, optional tapered alumina crucible | ||
Thermocouple | S type thermocouple | ||
Working current | ≤30A | ||
Max. power | 500W | ||
Gas delivery system | Flowmeter | Four-channel mass flowmeter | |
Flow range | MFC1 range: 0~200sccm MFC2 range: 0~200sccm MFC3 range: 0~500sccm MFC4 range: 0~500sccm Corresponding to gases H2, CH4, N2, Ar. | ||
Measurement accuracy | ±1.5%F.S | ||
Repeatability | ±0.2%FS | ||
Linear accuracy | ±1%F.S. | ||
Response time | ≤4s | ||
Work pressure | -0.15Mpa~0.15Mpa | ||
Flow control | LCD touch screen control, digital display, each channel gas contains needle valve for individually control. | ||
Intake Interface | It can be connected with 1/4NPS or 6mm outer diameter stainless steel pipe | ||
Outlet Interface | It can be connected with 1/4NPS or 6mm outer diameter stainless steel pipe | ||
Connection method | Double ferrule connector | ||
Operating temperature | 5~45℃ | ||
Gas premix | Equipped with gas premixing device | ||
Exhaust system | Product model | CY-GZK103-A | |
Molecular pump | Turbomolecular pump | ||
Backing pump | Two-stage rotary vane pump | ||
Pumping rate | Molecular pump: 600L/S | Comprehensive pumping performance: 30 minutes vacuum can reach: 5×10E-3Pa | |
Rotary vane pump: 1.1L/S | |||
Ultimate vacuum | 5×10E-4Pa | ||
Pumping port | KF40 | ||
Exhaust interface | KF16 | ||
Vacuum measurement | Compound vacuum gauge | ||
