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TN-PLD-450
TN
The PLD pulse laser deposition evaporation coating instrument is a highly versatile and efficient tool for preparing a wide range of thin film materials. This advanced instrument utilizes pulse laser deposition technology to precisely deposit thin films onto substrates with exceptional control and accuracy.
One of the key features of the PLD pulse laser deposition evaporation coating instrument is its ability to prepare various types of thin film materials, including superconducting films, oxide films, metal films, semiconductor films, and more. This makes it an ideal choice for researchers and scientists working in a variety of fields, from materials science to electronics.
With its advanced technology and precise deposition capabilities, the PLD pulse laser deposition evaporation coating instrument offers unparalleled performance and reliability. Its user-friendly interface and intuitive controls make it easy to operate, while its robust construction ensures long-lasting durability.
Whether you are conducting research in a laboratory setting or developing new materials for industrial applications, the PLD pulse laser deposition evaporation coating instrument is a valuable tool that can help you achieve your goals with precision and efficiency. Invest in this cutting-edge instrument today and take your thin film deposition capabilities to the next level.
Product name | PLD pulse laser deposition evaporation coating instrument | |
Product model | TN-PLD-450 | |
Main vacuum system | Sphere structure, size: dia. 450mm | |
Loading sample system | Vertical cylindrical stucture, size: dia. 150×150mm | |
Vacuum system configuration | Main vacuum chamber | Mechanical pump, molecular pump, valve |
Loading sample system | Mechanical pump and molecular pump(sharing with primary chamber), valve | |
Ultimate pressure | Main vacuum system | ≤6*10-6Pa(after baking and degassing) |
Loading sample system | ≤6*10-3 Pa(after baking and degassing) | |
Vacuum recovery system | Main vacuum system | It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) |
Loading sample system | It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) | |
Rotating target platform | The maximum size of the target is about 60mm. Four target materials can be installed at one time, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm | |
Substrate heating platform | Sample size | Dia. 51 |
Mode of motion | Substrate rotates continuously, rotation speed:5-60 rpm | |
Heating temperature | Maximum temperature of substrate heating: 800℃±1℃, Controlled and adjustable | |
Gas circuit system | 1-circuit mass flow controller, 1-circuit inflation valve | |
Optional accessories | Laser device | Compatible with coherent 201 laser |
Laser beam scanning device | 2D scanning mechanical platform, perform two degree of freedom scanning. | |
Computer control system | The contents of control include common conversion target, target rotation, sample rotation, sample temperature control, laser beam scanning, etc. | |
Floor Space | Main unit | 1800 * 1800mm2 |
Electric cabinet | 700 *700mm2(one) | |
The PLD pulse laser deposition evaporation coating instrument is a highly versatile and efficient tool for preparing a wide range of thin film materials. This advanced instrument utilizes pulse laser deposition technology to precisely deposit thin films onto substrates with exceptional control and accuracy.
One of the key features of the PLD pulse laser deposition evaporation coating instrument is its ability to prepare various types of thin film materials, including superconducting films, oxide films, metal films, semiconductor films, and more. This makes it an ideal choice for researchers and scientists working in a variety of fields, from materials science to electronics.
With its advanced technology and precise deposition capabilities, the PLD pulse laser deposition evaporation coating instrument offers unparalleled performance and reliability. Its user-friendly interface and intuitive controls make it easy to operate, while its robust construction ensures long-lasting durability.
Whether you are conducting research in a laboratory setting or developing new materials for industrial applications, the PLD pulse laser deposition evaporation coating instrument is a valuable tool that can help you achieve your goals with precision and efficiency. Invest in this cutting-edge instrument today and take your thin film deposition capabilities to the next level.
Product name | PLD pulse laser deposition evaporation coating instrument | |
Product model | TN-PLD-450 | |
Main vacuum system | Sphere structure, size: dia. 450mm | |
Loading sample system | Vertical cylindrical stucture, size: dia. 150×150mm | |
Vacuum system configuration | Main vacuum chamber | Mechanical pump, molecular pump, valve |
Loading sample system | Mechanical pump and molecular pump(sharing with primary chamber), valve | |
Ultimate pressure | Main vacuum system | ≤6*10-6Pa(after baking and degassing) |
Loading sample system | ≤6*10-3 Pa(after baking and degassing) | |
Vacuum recovery system | Main vacuum system | It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) |
Loading sample system | It can reach 5x10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) | |
Rotating target platform | The maximum size of the target is about 60mm. Four target materials can be installed at one time, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm | |
Substrate heating platform | Sample size | Dia. 51 |
Mode of motion | Substrate rotates continuously, rotation speed:5-60 rpm | |
Heating temperature | Maximum temperature of substrate heating: 800℃±1℃, Controlled and adjustable | |
Gas circuit system | 1-circuit mass flow controller, 1-circuit inflation valve | |
Optional accessories | Laser device | Compatible with coherent 201 laser |
Laser beam scanning device | 2D scanning mechanical platform, perform two degree of freedom scanning. | |
Computer control system | The contents of control include common conversion target, target rotation, sample rotation, sample temperature control, laser beam scanning, etc. | |
Floor Space | Main unit | 1800 * 1800mm2 |
Electric cabinet | 700 *700mm2(one) | |
