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Introducing our high-quality Manganese (Mn) Sputtering Targets, the ideal solution for your sputtering and thin film deposition needs.
Designed to meet the demands of various industries, our Manganese Sputtering Targets offer exceptional performance and reliability. Crafted with precision, these targets ensure consistent and uniform film deposition, resulting in superior thin film coatings.
Our Manganese Sputtering Targets are manufactured using state-of-the-art techniques, guaranteeing excellent purity levels and high density. This ensures optimal material utilization, minimizing waste and maximizing productivity.
In addition to sputtering targets, we also provide a wide range of evaporation sources and other deposition materials, enabling you to find all your deposition requirements under one roof.
With a professional tone of voice, we assure you that our Manganese Sputtering Targets meet the highest industry standards. Our team of experts is dedicated to delivering products that exceed your expectations, providing you with the utmost satisfaction.
Choose our Manganese (Mn) Sputtering Targets for your thin film deposition needs and experience the difference in performance and quality. Contact us today to discuss your specific requirements and let us assist you in achieving your deposition goals.
Manganese (Mn) Specifications:
Material Type | Manganese |
Symbol | Mn |
Atomic Weight | 54.93805 |
Atomic Number | 25 |
Color/Appearance | Silvery Metallic |
Thermal Conductivity | 7.8 W/m.K |
Melting Point (°C) | 1,244 |
Coefficient of Thermal Expansion | 21.7 x 10-6/K |
Theoretical Density (g/cc) | 7.2 |
Z Ratio | 0.377 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Elastomer |
Introducing our high-quality Manganese (Mn) Sputtering Targets, the ideal solution for your sputtering and thin film deposition needs.
Designed to meet the demands of various industries, our Manganese Sputtering Targets offer exceptional performance and reliability. Crafted with precision, these targets ensure consistent and uniform film deposition, resulting in superior thin film coatings.
Our Manganese Sputtering Targets are manufactured using state-of-the-art techniques, guaranteeing excellent purity levels and high density. This ensures optimal material utilization, minimizing waste and maximizing productivity.
In addition to sputtering targets, we also provide a wide range of evaporation sources and other deposition materials, enabling you to find all your deposition requirements under one roof.
With a professional tone of voice, we assure you that our Manganese Sputtering Targets meet the highest industry standards. Our team of experts is dedicated to delivering products that exceed your expectations, providing you with the utmost satisfaction.
Choose our Manganese (Mn) Sputtering Targets for your thin film deposition needs and experience the difference in performance and quality. Contact us today to discuss your specific requirements and let us assist you in achieving your deposition goals.
Manganese (Mn) Specifications:
Material Type | Manganese |
Symbol | Mn |
Atomic Weight | 54.93805 |
Atomic Number | 25 |
Color/Appearance | Silvery Metallic |
Thermal Conductivity | 7.8 W/m.K |
Melting Point (°C) | 1,244 |
Coefficient of Thermal Expansion | 21.7 x 10-6/K |
Theoretical Density (g/cc) | 7.2 |
Z Ratio | 0.377 |
Sputter | DC |
Max Power Density (Watts/Square Inch) | 20* |
Type of Bond | Elastomer |
