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Four Source High Vacuum Evaporation Coating Equipment for Metal Deposition in Perovskite Solar Cell

thermal metal evaporation unit for making metal contacts to semiconductor diodes
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  • TN-EVP325S-4S-T

  • TN

This equipment is a four-source high-vacuum evaporation coater. The equipment adopts a front-opening door vacuum chamber design. In addition, the chamber is increased to 500mm. The distance between the sample stage and the evaporation source has a larger adjustment range, which can adapt to various evaporation needs. It avoids the sample being damaged by the high temperature of the evaporation source.

The chamber adopts an top sample stage, the sample stage can be rotated, heated and lifted, and all operations can be integrated and controlled through the touch screen. The equipment vacuum system is a two-stage vacuum system composed of a two-stage rotary vane pump and a turbo molecular pump, which can provide a clean and oil-free high vacuum environment. The equipment is equipped with a pneumatic valve system. Through the automatic control of the operating system, the user can perform operations such as one-button vacuum pumping, non-stop take out and place sample, and complete shutdown from the touch screen.

The equipment is equipped with four sets of tungsten boat evaporation sources and water-cooled copper electrode. Each evaporation source supports a large current of 100A and a heating temperature of 1800℃. It can realize multi-layer coating or mixed coating of multiple materials.

Technical parameters:

Four   source high vacuum evaporation coating equipment

Sample   stage

Size

Maximum   support φ150mm samples

Height

Adjustable   up and down 140mm

Evaporation   source

Quantity

Tungsten   Boat x4



Vacuum   chamber

Chamber   size

φ325mm   x 510mm

Observation   window

Front   φ100mm with shading plate

Chamber   material

304   stainless steel

Open   method

Front   door opening

Film   thickness control

Crystal   oscillator type film thickness measuring instrument, optional multi-channel   film thickness controller

Vacuum   system

Backing   pump

Two   stage rotary vane pump

Pumping   port

KF16

Secondary   pump

Turbomolecular   pump

Pumping   port

CF160

Vacuum   measurement

Resistance   + ionization

Compound   vacuum gauge

Exhaust   rate

Mechanical   pump 1.1L/s

Ultimate   vacuum

1.0E-5Pa

Power   supply

Molecular   pump 600L/s

Control   system

PLC   automatic control

Operation   interface: touch screen + operation panel

Others

Supply   voltage

AC220V,50Hz

Overall   size

1000mm   x 800mm x 1500mm

Total   power

10kW

Total   Weight

350kg


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