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Magnesium (Mg) Sputtering Targets

sputtering targets, evaporation sources and other deposition materials
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Introducing our top-of-the-line Magnesium (Mg) Sputtering Targets, designed to meet the highest industry standards. These targets are perfect for sputtering applications, evaporation sources, and various other deposition processes.


Crafted with precision and expertise, our Magnesium (Mg) Sputtering Targets offer exceptional performance and reliability. They are engineered to deliver consistent and uniform film deposition, ensuring superior quality and efficiency in your thin film coating applications.


Our sputtering targets are manufactured using high-purity magnesium, guaranteeing exceptional purity levels and minimal impurities. This ensures that your deposition processes are free from any unwanted contaminants, leading to high-quality and defect-free thin films.


With a professional tone of voice, we take pride in offering a wide range of deposition materials, including our Magnesium (Mg) Sputtering Targets. We understand the importance of reliable and durable materials for your applications, and that's why we ensure that our products undergo rigorous quality checks and meet the strictest industry standards.


Whether you are in the semiconductor, optical coating, or display industries, our Magnesium (Mg) Sputtering Targets are the perfect choice for your thin film deposition needs. Trust in our expertise and experience to provide you with the highest quality products that will enhance the performance and efficiency of your deposition processes.


Invest in our Magnesium (Mg) Sputtering Targets today and experience the difference in your thin film coating applications. Choose professionalism, reliability, and excellence for your deposition materials - choose our sputtering targets, evaporation sources, and other deposition materials.

Magnesium (Mg) Specifications:

Material Type

Magnesium

Symbol

Mg

Atomic Weight

24.305

Atomic Number

12

Color/Appearance

Silvery White, Metallic

Thermal Conductivity

160 W/m.K

Melting Point (°C)

649

Coefficient of Thermal   Expansion

8.2 x 10-6/K

Theoretical Density (g/cc)

1.74

Z Ratio

1.61

Sputter

DC

Max Power Density

(Watts/Square Inch)

50*

Type of Bond

Indium, Elastomer

Export Control (ECCN)

1C228

Comments

Extremely high rates   possible.


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