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Introducing our Lanthanum Aluminate (LaAlO3) Sputtering Targets, the ultimate solution for your sputtering and deposition needs. As a leading provider of high-quality materials, we offer a wide range of sputtering targets, evaporation sources, and other deposition materials to meet your specific requirements.
Our Lanthanum Aluminate (LaAlO3) Sputtering Targets are meticulously engineered using state-of-the-art technology and superior materials. Crafted with precision, these targets ensure exceptional performance and reliability in various thin film deposition applications.
Featuring exceptional purity and uniformity, our Lanthanum Aluminate (LaAlO3) Sputtering Targets guarantee optimal film quality and deposition efficiency. Their exceptional thermal conductivity and excellent mechanical properties make them ideal for demanding sputtering processes, ensuring consistent and precise results.
Designed to meet the highest industry standards, our Lanthanum Aluminate (LaAlO3) Sputtering Targets are suitable for a wide range of applications, including semiconductor manufacturing, optical coatings, and research laboratories. Their versatility and compatibility with different deposition techniques make them a valuable asset in achieving superior thin film performance.
At [Company Name], we prioritize quality and customer satisfaction. Our team of experts is dedicated to providing you with reliable and durable sputtering targets, evaporation sources, and deposition materials that meet your specific needs. We understand the importance of precision and consistency in your processes, and our products are designed to deliver exceptional results every time.
Choose our Lanthanum Aluminate (LaAlO3) Sputtering Targets for unparalleled performance, reliability, and efficiency in your sputtering and deposition applications. Experience the difference of working with a trusted partner committed to delivering excellence in materials and customer service. Contact us today to discuss your requirements and discover the perfect solution for your thin film deposition needs.
Lanthanum Aluminate (LaAlO3) Specifications：
Model size:
Material | Size | purity | Compatible Guns |
Lanthanum Aluminate | 1.00" Dia. x 0.250" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 1.00" Dia. x 0.125" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 2.00" Dia. x 0.250" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 2.00" Dia. x 0.125" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 3.00" Dia. x 0.250" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 3.00" Dia. x 0.125" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 4.00" Dia. x 0.250" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 4.00" Dia. x 0.125" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 6.00" Dia. x 0.250" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 6.00" Dia. x 0.125" Thick | 99.9% | Most Standard Guns |
Introducing our Lanthanum Aluminate (LaAlO3) Sputtering Targets, the ultimate solution for your sputtering and deposition needs. As a leading provider of high-quality materials, we offer a wide range of sputtering targets, evaporation sources, and other deposition materials to meet your specific requirements.
Our Lanthanum Aluminate (LaAlO3) Sputtering Targets are meticulously engineered using state-of-the-art technology and superior materials. Crafted with precision, these targets ensure exceptional performance and reliability in various thin film deposition applications.
Featuring exceptional purity and uniformity, our Lanthanum Aluminate (LaAlO3) Sputtering Targets guarantee optimal film quality and deposition efficiency. Their exceptional thermal conductivity and excellent mechanical properties make them ideal for demanding sputtering processes, ensuring consistent and precise results.
Designed to meet the highest industry standards, our Lanthanum Aluminate (LaAlO3) Sputtering Targets are suitable for a wide range of applications, including semiconductor manufacturing, optical coatings, and research laboratories. Their versatility and compatibility with different deposition techniques make them a valuable asset in achieving superior thin film performance.
At [Company Name], we prioritize quality and customer satisfaction. Our team of experts is dedicated to providing you with reliable and durable sputtering targets, evaporation sources, and deposition materials that meet your specific needs. We understand the importance of precision and consistency in your processes, and our products are designed to deliver exceptional results every time.
Choose our Lanthanum Aluminate (LaAlO3) Sputtering Targets for unparalleled performance, reliability, and efficiency in your sputtering and deposition applications. Experience the difference of working with a trusted partner committed to delivering excellence in materials and customer service. Contact us today to discuss your requirements and discover the perfect solution for your thin film deposition needs.
Lanthanum Aluminate (LaAlO3) Specifications：
Model size:
Material | Size | purity | Compatible Guns |
Lanthanum Aluminate | 1.00" Dia. x 0.250" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 1.00" Dia. x 0.125" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 2.00" Dia. x 0.250" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 2.00" Dia. x 0.125" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 3.00" Dia. x 0.250" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 3.00" Dia. x 0.125" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 4.00" Dia. x 0.250" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 4.00" Dia. x 0.125" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 6.00" Dia. x 0.250" Thick | 99.9% | Most Standard Guns |
Lanthanum Aluminate | 6.00" Dia. x 0.125" Thick | 99.9% | Most Standard Guns |
