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TN-EBH500-SS
TN
The high vacuum electron beam (e-beam) evaporation coating machine is a sophisticated and specialized piece of equipment designed for depositing thin films onto a variety of substrates. This machine utilizes an electron beam to evaporate materials, creating a high-quality and uniform coating on the surface of the substrate.
With its advanced technology and precise control mechanisms, the high vacuum electron beam (e-beam) evaporation coating machine offers unparalleled accuracy and efficiency in the coating process. It is capable of depositing a wide range of materials, including metals, oxides, and semiconductors, onto substrates of various shapes and sizes.
This cutting-edge machine is ideal for applications in industries such as electronics, optics, and aerospace, where thin film coatings are essential for enhancing the performance and durability of products. Its high vacuum environment ensures a clean and contamination-free coating process, resulting in superior adhesion and film quality.
In addition, the high vacuum electron beam (e-beam) evaporation coating machine is equipped with advanced features such as real-time monitoring and control systems, allowing for precise adjustment of deposition parameters to achieve the desired coating thickness and properties. Its user-friendly interface makes it easy to operate and maintain, ensuring consistent and reliable performance.
Overall, the high vacuum electron beam (e-beam) evaporation coating machine is a valuable tool for researchers and manufacturers seeking to achieve high-quality thin film coatings with exceptional precision and repeatability. Its innovative design and advanced capabilities make it a top choice for demanding applications that require superior coating performance.
Product name | Electron beam evaporation coating mmachine |
Product model | TN-EBH500-SS |
Service condition | Ambient temperature ranged from 5 to 40℃ |
Source | Three phase 380V |
Voltage | 220V 50HZ |
Power | <20 kW |
Water gage | <2.5bar |
Plated layer monitoring | Using SQM160 membrane thickness monitor, the inhomogeneity of coating thickness is less than 6%. |
Heat lamp | Four halogen heating lamps were used for degassing and one neon lamp for lighting |
The electrode interface | With a 2-way metal evaporation electrode interface, backup |
Water cooling system | Water pressure monitoring |
Observation window | 100mm in diameter, with X-ray filter glass |
Control system | Touch screen system |
Vacuum chamber dimensions | Evaporation chamber dimensions: Φ 500 * H500mm |
Electron gun | New electronic gun, a 6-hole crucible |
Sample turntable | Sample size: <150mm, the sample table can rotate, the sample table surface and the electron gun surface distance adjustment up and down, the adjustment distance is 200mm-250mm, the sample table can be heated, heating temperature <500℃. |
System vacuum degree | A. Limit vacuum: baking for 12~24 hours, continuous pumping, vacuum less than 5x10-5Pa B. Extraction rate: a vacuum <5x10 in 40 minutes, starting from the atmosphere-4Pa C. System leakage rate: after 12 hours of shutdown, measure the vacuum degree of the vacuum chamber is <10Pa |
The vacuum unit | FB1200 Molecular pump + VRD-16 front stage pump + side extraction valve + gate valve + cut-off valve + composite vacuum meter + coating monitoring vacuum meter interface (standby) |
Electron beam evaporation coater video:
The high vacuum electron beam (e-beam) evaporation coating machine is a sophisticated and specialized piece of equipment designed for depositing thin films onto a variety of substrates. This machine utilizes an electron beam to evaporate materials, creating a high-quality and uniform coating on the surface of the substrate.
With its advanced technology and precise control mechanisms, the high vacuum electron beam (e-beam) evaporation coating machine offers unparalleled accuracy and efficiency in the coating process. It is capable of depositing a wide range of materials, including metals, oxides, and semiconductors, onto substrates of various shapes and sizes.
This cutting-edge machine is ideal for applications in industries such as electronics, optics, and aerospace, where thin film coatings are essential for enhancing the performance and durability of products. Its high vacuum environment ensures a clean and contamination-free coating process, resulting in superior adhesion and film quality.
In addition, the high vacuum electron beam (e-beam) evaporation coating machine is equipped with advanced features such as real-time monitoring and control systems, allowing for precise adjustment of deposition parameters to achieve the desired coating thickness and properties. Its user-friendly interface makes it easy to operate and maintain, ensuring consistent and reliable performance.
Overall, the high vacuum electron beam (e-beam) evaporation coating machine is a valuable tool for researchers and manufacturers seeking to achieve high-quality thin film coatings with exceptional precision and repeatability. Its innovative design and advanced capabilities make it a top choice for demanding applications that require superior coating performance.
Product name | Electron beam evaporation coating mmachine |
Product model | TN-EBH500-SS |
Service condition | Ambient temperature ranged from 5 to 40℃ |
Source | Three phase 380V |
Voltage | 220V 50HZ |
Power | <20 kW |
Water gage | <2.5bar |
Plated layer monitoring | Using SQM160 membrane thickness monitor, the inhomogeneity of coating thickness is less than 6%. |
Heat lamp | Four halogen heating lamps were used for degassing and one neon lamp for lighting |
The electrode interface | With a 2-way metal evaporation electrode interface, backup |
Water cooling system | Water pressure monitoring |
Observation window | 100mm in diameter, with X-ray filter glass |
Control system | Touch screen system |
Vacuum chamber dimensions | Evaporation chamber dimensions: Φ 500 * H500mm |
Electron gun | New electronic gun, a 6-hole crucible |
Sample turntable | Sample size: <150mm, the sample table can rotate, the sample table surface and the electron gun surface distance adjustment up and down, the adjustment distance is 200mm-250mm, the sample table can be heated, heating temperature <500℃. |
System vacuum degree | A. Limit vacuum: baking for 12~24 hours, continuous pumping, vacuum less than 5x10-5Pa B. Extraction rate: a vacuum <5x10 in 40 minutes, starting from the atmosphere-4Pa C. System leakage rate: after 12 hours of shutdown, measure the vacuum degree of the vacuum chamber is <10Pa |
The vacuum unit | FB1200 Molecular pump + VRD-16 front stage pump + side extraction valve + gate valve + cut-off valve + composite vacuum meter + coating monitoring vacuum meter interface (standby) |
Electron beam evaporation coater video:
