TN
Our High Temperature Vertical Sliding Rotary PECVD Tube Furnace Machine is a state-of-the-art equipment designed to meet the demanding requirements of these industries.
This machine utilizes the PECVD technique to deposit high-quality thin films with exceptional uniformity and adhesion. With its vertical sliding rotary design, it offers enhanced flexibility and efficiency in the deposition process. The vertical sliding feature allows easy loading and unloading of substrates, minimizing downtime and maximizing productivity.
The furnace is capable of reaching high temperatures up to [insert temperature range] with precise temperature control. This ensures the optimal conditions for film deposition, resulting in superior film quality and performance. The rotary motion further enhances film uniformity by enabling even distribution of precursor gases across the substrate surface.
Equipped with advanced plasma generation technology, our PECVD Tube Furnace Machine ensures efficient plasma excitation, leading to enhanced film properties and reduced defects. The plasma enhances chemical reactions, resulting in improved film density, hardness, and adhesion. This makes it an ideal choice for applications requiring high-performance thin films.
The machine is equipped with a user-friendly control panel, allowing for easy operation and monitoring of the deposition process. It offers various programmable parameters, such as deposition time, temperature, gas flow rates, and pressure, enabling precise control and customization of the film properties.
Additionally, our PECVD Tube Furnace Machine is designed with safety features to ensure operator protection and minimize the risk of accidents. It is built with high-quality materials and components, guaranteeing durability and long-term reliability.
Overall, our High Temperature Vertical Sliding Rotary PECVD Tube Furnace Machine is a cutting-edge solution for thin film deposition in the electronics industry. It offers superior performance, flexibility, and ease of use, making it an essential tool for research laboratories, universities, and production facilities. Invest in our PECVD Tube Furnace Machine to achieve exceptional thin film quality and accelerate your research and development processes.
Technical Parameters
Dual temperature zone tube furnace | Product model | CY-O1200-60IIC-R |
Equipment power | 3KW | |
Furnace tube material | High purity quartz | |
Furnace tube size | Φ60*420+Φ100*360+Φ60*420mm (Quartz heteromorphic tube) | |
Furnace chamber length | 440mm | |
Heating zone length | 200mm+200mm | |
Operating temperature | 0～1150℃ | |
Limit temperature | 1200℃ | |
Temperature control accuracy | ±1℃ | |
Thermocouple type | K-type thermocouple | |
Temperature control mode | 30-segment program temperature control, PID parameter self-tuning | |
Display mode | HD full color LCD touch screen | |
Sealing method | 304 stainless steel vacuum flange | |
Power supply | AC: 220V 50/60Hz | |
Rotation speed | 0~13rpm | |
Tilt angle | 0~35° | |
3-channel mass flow meter | Product model | CY-3Z |
Number of gas paths | 3 channels | |
Flowmeter type | Mass flowmeter | |
Measuring range | A channel: 0~100sccm; B channel: 0~200 sccm; C channel: 0~500 sccm | |
Measurement accuracy | ±1.5% | |
Working pressure difference | 0.1~0.5MPa | |
Pipeline interface | 1/4 inch ferrule connector | |
Power supply | AC220V 50/60Hz | |
Vacuum system | Vacuum pump | Dual stage rotary vane pump |
Pumping speed | 1.1L/s | |
Pumping port | KF16 | |
Pump ultimate vacuum | 10E-1Pa | |
Power supply | AC220V 50/60Hz | |
RF power supply | Signal frequency | 13.56MHz±0.005% |
Power output range | 0~500W | |
Maximum reflected power | 100W | |
RF output interface | 50Ω, N-Type, female | |
Power stability | ≤5W |
Our High Temperature Vertical Sliding Rotary PECVD Tube Furnace Machine is a state-of-the-art equipment designed to meet the demanding requirements of these industries.
This machine utilizes the PECVD technique to deposit high-quality thin films with exceptional uniformity and adhesion. With its vertical sliding rotary design, it offers enhanced flexibility and efficiency in the deposition process. The vertical sliding feature allows easy loading and unloading of substrates, minimizing downtime and maximizing productivity.
The furnace is capable of reaching high temperatures up to [insert temperature range] with precise temperature control. This ensures the optimal conditions for film deposition, resulting in superior film quality and performance. The rotary motion further enhances film uniformity by enabling even distribution of precursor gases across the substrate surface.
Equipped with advanced plasma generation technology, our PECVD Tube Furnace Machine ensures efficient plasma excitation, leading to enhanced film properties and reduced defects. The plasma enhances chemical reactions, resulting in improved film density, hardness, and adhesion. This makes it an ideal choice for applications requiring high-performance thin films.
The machine is equipped with a user-friendly control panel, allowing for easy operation and monitoring of the deposition process. It offers various programmable parameters, such as deposition time, temperature, gas flow rates, and pressure, enabling precise control and customization of the film properties.
Additionally, our PECVD Tube Furnace Machine is designed with safety features to ensure operator protection and minimize the risk of accidents. It is built with high-quality materials and components, guaranteeing durability and long-term reliability.
Overall, our High Temperature Vertical Sliding Rotary PECVD Tube Furnace Machine is a cutting-edge solution for thin film deposition in the electronics industry. It offers superior performance, flexibility, and ease of use, making it an essential tool for research laboratories, universities, and production facilities. Invest in our PECVD Tube Furnace Machine to achieve exceptional thin film quality and accelerate your research and development processes.
Technical Parameters
Dual temperature zone tube furnace | Product model | CY-O1200-60IIC-R |
Equipment power | 3KW | |
Furnace tube material | High purity quartz | |
Furnace tube size | Φ60*420+Φ100*360+Φ60*420mm (Quartz heteromorphic tube) | |
Furnace chamber length | 440mm | |
Heating zone length | 200mm+200mm | |
Operating temperature | 0～1150℃ | |
Limit temperature | 1200℃ | |
Temperature control accuracy | ±1℃ | |
Thermocouple type | K-type thermocouple | |
Temperature control mode | 30-segment program temperature control, PID parameter self-tuning | |
Display mode | HD full color LCD touch screen | |
Sealing method | 304 stainless steel vacuum flange | |
Power supply | AC: 220V 50/60Hz | |
Rotation speed | 0~13rpm | |
Tilt angle | 0~35° | |
3-channel mass flow meter | Product model | CY-3Z |
Number of gas paths | 3 channels | |
Flowmeter type | Mass flowmeter | |
Measuring range | A channel: 0~100sccm; B channel: 0~200 sccm; C channel: 0~500 sccm | |
Measurement accuracy | ±1.5% | |
Working pressure difference | 0.1~0.5MPa | |
Pipeline interface | 1/4 inch ferrule connector | |
Power supply | AC220V 50/60Hz | |
Vacuum system | Vacuum pump | Dual stage rotary vane pump |
Pumping speed | 1.1L/s | |
Pumping port | KF16 | |
Pump ultimate vacuum | 10E-1Pa | |
Power supply | AC220V 50/60Hz | |
RF power supply | Signal frequency | 13.56MHz±0.005% |
Power output range | 0~500W | |
Maximum reflected power | 100W | |
RF output interface | 50Ω, N-Type, female | |
Power stability | ≤5W |
