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TN-SPC4-E
TN
Introducing the PP Cavity Small Spin Coater for Photoresist - a highly efficient and versatile solution for coating liquid or colloidal materials onto various substrates. Designed for professionals in the field, this spin coater is ideal for achieving thin films on silicon wafers, crystals, quartz, ceramics, and more.
With its advanced technology and precision engineering, our spin coater ensures a uniform and controlled distribution of photoresist, enabling accurate and reliable results. Whether you are working in research and development, semiconductor manufacturing, or any other industry requiring photoresist spin coating, this product is your go-to solution.
Key Features:
1. Wide Compatibility: Our spin coater can handle a range of substrates, including silicon wafers, crystals, quartz, ceramics, and others, allowing you to coat various materials effortlessly.
2. Precise Coating: Achieve thin and uniform films with ease, thanks to the advanced design of our spin coater. It guarantees a controlled distribution of liquid or colloidal materials, ensuring accurate and repeatable results.
3. User-Friendly Operation: Designed with professionals in mind, our spin coater offers a seamless user experience. Its intuitive interface and easy-to-use controls make it suitable for both experienced operators and newcomers to the industry.
4. Enhanced Efficiency: Save time and increase productivity with our spin coater's efficient performance. Its high rotational speed and optimized coating process allow for quick and reliable coating, reducing downtime and improving workflow.
5. Robust Construction: Built to withstand demanding environments, our spin coater is constructed with high-quality materials, ensuring durability and longevity. It is designed to withstand continuous usage, providing you with a reliable solution for your coating needs.
Invest in the PP Cavity Small Spin Coater for Photoresist today and experience the professional-grade performance it offers. With its exceptional features and reliable functionality, this spin coater is the perfect addition to your laboratory or production facility, delivering precise and consistent results every time.
Small Spin Coater Technical Parameters:
Item | Detail | |
Spin coater | Supply voltage | AC220V, 50Hz |
Spin speed | 0~8000rpm | |
Acceleration | 100~5000rpm/s | |
Speed resolution | 1rpm | |
Single step time | 3000s | |
Substrate size | Diameter ≤ 4 inches (100mm) | |
Chamber material | PP | |
Operation method | Button + LCD screen | |
Dispensing method | Manual dispensing, optional precision syringe pump | |
Coating curve | 5 segments per curve, a total of 5 curves can be stored | |
Pumping port | Φ8mm quick screw joint | |
Overall size | 210mm×250mm×180mm | |
Total Weight | 8kg | |
Exhaust system | Vacuum pump | Dry mechanical pump |
Pumping rate | 1.1L/s | |
Power supply | AC220V 50/60Hz |
Introducing the PP Cavity Small Spin Coater for Photoresist - a highly efficient and versatile solution for coating liquid or colloidal materials onto various substrates. Designed for professionals in the field, this spin coater is ideal for achieving thin films on silicon wafers, crystals, quartz, ceramics, and more.
With its advanced technology and precision engineering, our spin coater ensures a uniform and controlled distribution of photoresist, enabling accurate and reliable results. Whether you are working in research and development, semiconductor manufacturing, or any other industry requiring photoresist spin coating, this product is your go-to solution.
Key Features:
1. Wide Compatibility: Our spin coater can handle a range of substrates, including silicon wafers, crystals, quartz, ceramics, and others, allowing you to coat various materials effortlessly.
2. Precise Coating: Achieve thin and uniform films with ease, thanks to the advanced design of our spin coater. It guarantees a controlled distribution of liquid or colloidal materials, ensuring accurate and repeatable results.
3. User-Friendly Operation: Designed with professionals in mind, our spin coater offers a seamless user experience. Its intuitive interface and easy-to-use controls make it suitable for both experienced operators and newcomers to the industry.
4. Enhanced Efficiency: Save time and increase productivity with our spin coater's efficient performance. Its high rotational speed and optimized coating process allow for quick and reliable coating, reducing downtime and improving workflow.
5. Robust Construction: Built to withstand demanding environments, our spin coater is constructed with high-quality materials, ensuring durability and longevity. It is designed to withstand continuous usage, providing you with a reliable solution for your coating needs.
Invest in the PP Cavity Small Spin Coater for Photoresist today and experience the professional-grade performance it offers. With its exceptional features and reliable functionality, this spin coater is the perfect addition to your laboratory or production facility, delivering precise and consistent results every time.
Small Spin Coater Technical Parameters:
Item | Detail | |
Spin coater | Supply voltage | AC220V, 50Hz |
Spin speed | 0~8000rpm | |
Acceleration | 100~5000rpm/s | |
Speed resolution | 1rpm | |
Single step time | 3000s | |
Substrate size | Diameter ≤ 4 inches (100mm) | |
Chamber material | PP | |
Operation method | Button + LCD screen | |
Dispensing method | Manual dispensing, optional precision syringe pump | |
Coating curve | 5 segments per curve, a total of 5 curves can be stored | |
Pumping port | Φ8mm quick screw joint | |
Overall size | 210mm×250mm×180mm | |
Total Weight | 8kg | |
Exhaust system | Vacuum pump | Dry mechanical pump |
Pumping rate | 1.1L/s | |
Power supply | AC220V 50/60Hz |
