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TN-GKF411
TN
Purifying vacuum spin coater with two working station for Optical coating
Purified vacuum spin coater is a kind of equipment used for surface coating and treatment. It is mainly used in the following aspects:
Optical coating: Purified vacuum spin coater can be used to prepare optical coatings, such as mirrors and lenses. , filters, etc. By rotating the substrate in a vacuum environment, the paint or film material is evenly coated on the surface of the substrate to achieve improved optical properties.
Electronic devices: The purified vacuum spin coater can be used to prepare thin film coatings for electronic devices, such as organic light-emitting diodes (OLED), solar cells, etc. By rotating the substrate in a vacuum environment, organic materials or inorganic materials are coated on the surface of the substrate to achieve the functions and performance of the electronic device.
Material protection: The purified vacuum spin coater can be used to prepare protective coatings on materials. By rotating the substrate in a vacuum environment, the protective coating is coated on the surface of the material, thereby improving the material's wear resistance, corrosion resistance, high temperature resistance and other properties.
Biomedicine: Purified vacuum spin coating machines can be used in applications in the biomedical field, such as drug sustained release systems, biosensors, etc. By rotating the substrate in a vacuum environment, biological materials or drugs are coated on the surface of the substrate to achieve the functionality and performance of biomedical devices.
In summary, purified vacuum spin coaters are very versatile and can be used in various fields for surface coating and treatment to improve material performance and functionality.
Technical parameter
Model No. | TN-GKF411 |
Coating time | 1-99S |
Time accuracy | ±5% |
Coating speed | 0-8000RPM |
Speed accuracy | ±3% |
Working station | Two station |
Purifying Effect | 100 grade(USA Federal Standard) |
Operating area wind speed | 0.3-0.5m/s |
Wafer dimension | 10mm-100mm wafer or other material |
System control | PID Programmable control |
Outer dimension | 800x680x1700mm |
Purifying vacuum spin coater with two working station for Optical coating
Purified vacuum spin coater is a kind of equipment used for surface coating and treatment. It is mainly used in the following aspects:
Optical coating: Purified vacuum spin coater can be used to prepare optical coatings, such as mirrors and lenses. , filters, etc. By rotating the substrate in a vacuum environment, the paint or film material is evenly coated on the surface of the substrate to achieve improved optical properties.
Electronic devices: The purified vacuum spin coater can be used to prepare thin film coatings for electronic devices, such as organic light-emitting diodes (OLED), solar cells, etc. By rotating the substrate in a vacuum environment, organic materials or inorganic materials are coated on the surface of the substrate to achieve the functions and performance of the electronic device.
Material protection: The purified vacuum spin coater can be used to prepare protective coatings on materials. By rotating the substrate in a vacuum environment, the protective coating is coated on the surface of the material, thereby improving the material's wear resistance, corrosion resistance, high temperature resistance and other properties.
Biomedicine: Purified vacuum spin coating machines can be used in applications in the biomedical field, such as drug sustained release systems, biosensors, etc. By rotating the substrate in a vacuum environment, biological materials or drugs are coated on the surface of the substrate to achieve the functionality and performance of biomedical devices.
In summary, purified vacuum spin coaters are very versatile and can be used in various fields for surface coating and treatment to improve material performance and functionality.
Technical parameter
Model No. | TN-GKF411 |
Coating time | 1-99S |
Time accuracy | ±5% |
Coating speed | 0-8000RPM |
Speed accuracy | ±3% |
Working station | Two station |
Purifying Effect | 100 grade(USA Federal Standard) |
Operating area wind speed | 0.3-0.5m/s |
Wafer dimension | 10mm-100mm wafer or other material |
System control | PID Programmable control |
Outer dimension | 800x680x1700mm |
